Enhanced Photoluminescence and Optoelectronic Performance for Wrinkled 2D MoS2 Through Strain Regulation

IF 7.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Yuanqiang He, Hongjin Xiong, Qingkang Ren, Zhiwei Chen, Weirui Yu, Jieli Liu, Chao Wang, Jinlai Zhao
{"title":"Enhanced Photoluminescence and Optoelectronic Performance for Wrinkled 2D MoS2 Through Strain Regulation","authors":"Yuanqiang He,&nbsp;Hongjin Xiong,&nbsp;Qingkang Ren,&nbsp;Zhiwei Chen,&nbsp;Weirui Yu,&nbsp;Jieli Liu,&nbsp;Chao Wang,&nbsp;Jinlai Zhao","doi":"10.1002/adom.202500670","DOIUrl":null,"url":null,"abstract":"<p>Strain regulation for 2D molybdenum disulfide (MoS<sub>2</sub>) has become an active topic. Here, the pre-stretching method fabricates wrinkled 2D MoS<sub>2</sub> field-effect transistors (FETs), which exhibit an ultra-high on/off ratio (8.3 × 10<sup>7</sup>). The impacts of wrinkles on enhanced photoluminescence (PL) and optoelectronic performance are systematically investigated by experiments and simulations. High-resolution transmission electron microscopy (HRTEM) and Raman spectroscopy results indicate that the wrinkled 2D MoS<sub>2</sub> is subjected to a compressive strain (layer space decreases from 6.2 to 6.1 Å), alongside a redshift in the Raman signals. The PL intensity of wrinkled 2D MoS<sub>2</sub> shows a significant enhancement of up to 133% at the strain of 1.683%. Furthermore, the PL results suggest that the wrinkles can effectively adjust the bandgap (30 meV/%). The on/off ratio of the wrinkled FET is an order of magnitude higher than that of flat FET (2.0 × 10<sup>6</sup>). Photoelectric measurements show that the dark and photocurrents of the wrinkled FET are enhanced by 200% and 47% at a gate voltage of 40 V, meanwhile, the response time is increased by 70%. Density-functional theory (DFT) and technology computer-aided design (TCAD) simulation are closely aligned with the experimental results for wrinkled 2D MoS<sub>2</sub>.</p>","PeriodicalId":116,"journal":{"name":"Advanced Optical Materials","volume":"13 21","pages":""},"PeriodicalIF":7.2000,"publicationDate":"2025-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Optical Materials","FirstCategoryId":"88","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/adom.202500670","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
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Abstract

Strain regulation for 2D molybdenum disulfide (MoS2) has become an active topic. Here, the pre-stretching method fabricates wrinkled 2D MoS2 field-effect transistors (FETs), which exhibit an ultra-high on/off ratio (8.3 × 107). The impacts of wrinkles on enhanced photoluminescence (PL) and optoelectronic performance are systematically investigated by experiments and simulations. High-resolution transmission electron microscopy (HRTEM) and Raman spectroscopy results indicate that the wrinkled 2D MoS2 is subjected to a compressive strain (layer space decreases from 6.2 to 6.1 Å), alongside a redshift in the Raman signals. The PL intensity of wrinkled 2D MoS2 shows a significant enhancement of up to 133% at the strain of 1.683%. Furthermore, the PL results suggest that the wrinkles can effectively adjust the bandgap (30 meV/%). The on/off ratio of the wrinkled FET is an order of magnitude higher than that of flat FET (2.0 × 106). Photoelectric measurements show that the dark and photocurrents of the wrinkled FET are enhanced by 200% and 47% at a gate voltage of 40 V, meanwhile, the response time is increased by 70%. Density-functional theory (DFT) and technology computer-aided design (TCAD) simulation are closely aligned with the experimental results for wrinkled 2D MoS2.

Abstract Image

通过应变调节增强起皱二维MoS2的光致发光和光电子性能
二维二硫化钼(MoS2)的应变调节已成为一个活跃的课题。在这里,预拉伸方法制造出褶皱的二维MoS2场效应晶体管(fet),其具有超高的开/关比(8.3 × 107)。通过实验和模拟系统地研究了褶皱对增强光致发光(PL)和光电子性能的影响。高分辨率透射电子显微镜(HRTEM)和拉曼光谱结果表明,皱巴巴的二维二硫mos2受到压缩应变(层间距从6.2减小到6.1 Å),并伴有拉曼信号的红移。当应变为1.683%时,起皱的二维二硫化钼的发光强度显著提高了133%。此外,PL结果表明,褶皱可以有效地调节带隙(30 meV/%)。褶皱FET的通断比比平面FET (2.0 × 106)高一个数量级。光电测量结果表明,在栅极电压为40 V时,褶皱FET的暗电流和光电流分别提高了200%和47%,响应时间提高了70%。密度泛函理论(DFT)和技术计算机辅助设计(TCAD)模拟与二维二硫化钼皱化的实验结果吻合较好。
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来源期刊
Advanced Optical Materials
Advanced Optical Materials MATERIALS SCIENCE, MULTIDISCIPLINARY-OPTICS
CiteScore
13.70
自引率
6.70%
发文量
883
审稿时长
1.5 months
期刊介绍: Advanced Optical Materials, part of the esteemed Advanced portfolio, is a unique materials science journal concentrating on all facets of light-matter interactions. For over a decade, it has been the preferred optical materials journal for significant discoveries in photonics, plasmonics, metamaterials, and more. The Advanced portfolio from Wiley is a collection of globally respected, high-impact journals that disseminate the best science from established and emerging researchers, aiding them in fulfilling their mission and amplifying the reach of their scientific discoveries.
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