Cryogenic sample preparation: Comparative analysis of Ga+ and Xe+ FIB milling for TEM and APT examination of zirconium

IF 2.1 3区 工程技术 Q2 MICROSCOPY
Ömer Koç , Benjamin M. Jenkins , Jack Haley , Christina Hofer , Martin S. Meier , Megan E. Jones , Robert W. Harrison , Michael Preuss , Michael P. Moody , Christopher R.M. Grovenor , Philipp Frankel
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Abstract

Specimen preparation is a key step in the characterisation of materials systems. For high-resolution characterisation techniques such as transmission electron microscopy (TEM) and atom probe tomography (APT), it is necessary to have a sample preparation method that creates the nano-scale samples required for analysis but does not significantly modify the initial microstructure.
The preparation of hexagonal close-packed materials by focussed ion beam milling (FIB) and electropolishing has previously been shown to be complicated by hydride formation. The formation of hydrides can be reduced by the application of cryogenic temperatures during the final stages of Ga+ ion FIB milling, which are often conducted at low accelerating voltages in order to minimise irradiation-induced damage.
Xe+ ion plasma FIBs are now commonly used in the preparation of samples due to their higher milling rates. However, the severity of the hydride formation in hexagonal close-packed materials during Xe+ ion milling is unclear. In this paper, we compare Xe+ and Ga+ FIB milling to prepare Zr samples at ambient and cryogenic temperatures. By studying TEM and APT samples, we are able to compare the levels of hydride formation after FIB preparation caused by the different preparation techniques. APT is used to estimate the levels of hydrogen in the samples. These results represent an important contribution to researchers who use FIB preparation to create TEM and APT specimens from hexagonal close-packed metals such as zirconium.
低温样品制备:用Ga+和Xe+ FIB铣削法对锆进行TEM和APT检测的对比分析
试样制备是表征材料系统的关键步骤。对于高分辨率表征技术,如透射电子显微镜(TEM)和原子探针断层扫描(APT),有必要有一种样品制备方法,该方法可以创建分析所需的纳米级样品,但不会显着改变初始微观结构。通过聚焦离子束铣削(FIB)和电抛光制备六方密排材料之前已经被证明是复杂的氢化物形成。在Ga+离子FIB铣削的最后阶段,通常在低加速电压下进行,以尽量减少辐照引起的损伤,通过低温可以减少氢化物的形成。由于其较高的铣削速率,Xe+离子等离子体fib现在通常用于制备样品。然而,在Xe+离子铣削过程中,六边形密排材料中氢化物形成的严重程度尚不清楚。在本文中,我们比较了在常温和低温下用Xe+和Ga+ FIB铣削制备Zr样品。通过研究TEM和APT样品,我们可以比较不同制备技术导致的FIB制备后氢化物生成水平。APT用于估计样品中氢的含量。这些结果对于使用FIB制备六边形密排金属(如锆)的TEM和APT样品的研究人员来说是一个重要的贡献。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Ultramicroscopy
Ultramicroscopy 工程技术-显微镜技术
CiteScore
4.60
自引率
13.60%
发文量
117
审稿时长
5.3 months
期刊介绍: Ultramicroscopy is an established journal that provides a forum for the publication of original research papers, invited reviews and rapid communications. The scope of Ultramicroscopy is to describe advances in instrumentation, methods and theory related to all modes of microscopical imaging, diffraction and spectroscopy in the life and physical sciences.
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