Exceptional Second Harmonic Generation in Ultraviolet Nonlinear Optical Oxyfluoroniobate Crystals via Structural Fingerprint Optimization of Polar Chains.

IF 16.9
Congcong Jin, Yang Li, Jin Seong Kim, Jong-Hoon Lim, Hongbo Huang, Chong-An Chen, Jihyun Lee, Yejin Heo, Bingbing Zhang, Joon Ik Jang, Kang Min Ok
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Abstract

Partial fluorination of oxides has positioned oxyfluorides as a promising class of nonlinear optical (NLO) materials owing to their balanced optical properties. However, effectively arranging optical chromophores to achieve strong optical nonlinearity remains challenging. In this study, we explore the structural chemistry of 1[NbOF4] chain-based oxyfluoroniobates and establish a molecular geometric framework to quantify key structural fingerprint factors, namely, the ∠(O─Nb─O') bond angle, χ[F,Nb,Nb',F'] torsion angle, chain alignment, and distortion of [NbO2F4] nodes. Theoretical calculations confirm that these factors critically influence second harmonic generation (SHG) activity. By integrating π-conjugated biuret (C2H5N3O2) molecules with optimally aligned 1[NbOF4] chains, we synthesized (H3O)(Biu)2(NbOF4) (Biu = biuret), a crystal exhibiting a record-breaking SHG response, reaching 10.8 times that of KH2PO4, among transition metal (TM) oxyfluorides. Its moderate birefringence (Δn = 0.062 @1064 nm) and wide band gap (Eg = 4.50 eV) further support its potential as a high-performance ultraviolet (UV) NLO material. These results highlight the power of structural fingerprint optimization in fully activating polar chains and offer a new strategy for designing next-generation UV NLO crystals with enhanced SHG performance.

基于极性链结构指纹优化的紫外非线性光学氟氧膦酸盐晶体异常二次谐波的产生。
氧化物的部分氟化使氟氧化物由于其平衡的光学性质而成为一类有前途的非线性光学材料。然而,有效地排列光学发色团以实现强光学非线性仍然是一个挑战。在本研究中,我们探索了1[NbOF4]∞链基氧氟酸盐的结构化学,并建立了分子几何框架来量化关键的结构指纹因子,即∠(O-Nb-O')键角、χ[F, Nb, Nb‘, F’]扭角、链取向和[NbO2F4]节点畸变。理论计算证实,这些因素严重影响二次谐波产生(SHG)的活度。通过将π共轭双缩脲(C2H5N3O2)分子与最佳排列的1[NbOF4]∞链进行积分,合成了(h30)(Biu)2(NbOF4) (Biu = biuret)晶体,该晶体在过渡金属(TM)氧氟化物中具有破纪录的SHG响应,达到KH2PO4的10.8倍。其适度的双折射(Δn = 0.062 @1064 nm)和宽带隙(Eg = 4.50 eV)进一步支持了其作为高性能紫外(UV) NLO材料的潜力。这些结果突出了结构指纹优化在完全激活极性链中的作用,并为设计具有增强SHG性能的下一代UV NLO晶体提供了新的策略。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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