{"title":"Effect of residual nanotwin on electromigration in copper lines with bamboo-like structures","authors":"Yi-Quan Lin, Yu-Wen Hung, Dinh-Phuc Tran, Chih Chen","doi":"10.1016/j.jmrt.2025.06.076","DOIUrl":null,"url":null,"abstract":"<div><div>Electromigration (EM) poses significant reliability challenges, especially as the line/space (L/S) of Cu redistribution lines (RDLs) continues to scale down. This study investigates the EM lifetime reliability of bamboo-like (BL) structure Cu lines with and without nanotwins. EM tests were conducted under a high current density (1.0 × 10<sup>6</sup> A/cm<sup>2</sup>) at a low temperature (150 °C) in ambient air. The results show that BL nanotwinned Cu (BL-NT-Cu) lines exhibited densely packed twin boundaries (twin spacing = 108 nm), a high fraction of (111)-oriented grains (64 %), and a lower oxidation rate (0.04 nm/h) compared to BL-Cu lines, which contributed to enhanced EM resistance. It was found that BL-NT-Cu lines had a significantly longer EM lifetime (T<sub>50</sub> = 3551 h) than BL-Cu lines (T<sub>50</sub> = 779 h). The study highlights the potential of the BL-NT-Cu structural design in improving the EM reliability of fine L/S Cu-RDLs, offering a viable strategy for developing high-density, high-performance advanced packaging applications.</div></div>","PeriodicalId":54332,"journal":{"name":"Journal of Materials Research and Technology-Jmr&t","volume":"37 ","pages":"Pages 921-928"},"PeriodicalIF":6.6000,"publicationDate":"2025-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Research and Technology-Jmr&t","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2238785425014991","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Electromigration (EM) poses significant reliability challenges, especially as the line/space (L/S) of Cu redistribution lines (RDLs) continues to scale down. This study investigates the EM lifetime reliability of bamboo-like (BL) structure Cu lines with and without nanotwins. EM tests were conducted under a high current density (1.0 × 106 A/cm2) at a low temperature (150 °C) in ambient air. The results show that BL nanotwinned Cu (BL-NT-Cu) lines exhibited densely packed twin boundaries (twin spacing = 108 nm), a high fraction of (111)-oriented grains (64 %), and a lower oxidation rate (0.04 nm/h) compared to BL-Cu lines, which contributed to enhanced EM resistance. It was found that BL-NT-Cu lines had a significantly longer EM lifetime (T50 = 3551 h) than BL-Cu lines (T50 = 779 h). The study highlights the potential of the BL-NT-Cu structural design in improving the EM reliability of fine L/S Cu-RDLs, offering a viable strategy for developing high-density, high-performance advanced packaging applications.
期刊介绍:
The Journal of Materials Research and Technology is a publication of ABM - Brazilian Metallurgical, Materials and Mining Association - and publishes four issues per year also with a free version online (www.jmrt.com.br). The journal provides an international medium for the publication of theoretical and experimental studies related to Metallurgy, Materials and Minerals research and technology. Appropriate submissions to the Journal of Materials Research and Technology should include scientific and/or engineering factors which affect processes and products in the Metallurgy, Materials and Mining areas.