Multimode objective lens for momentum microscopy and XPEEM: Theory

IF 2 3区 工程技术 Q2 MICROSCOPY
Olena Tkach, Gerd Schönhense
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引用次数: 0

Abstract

The strong electric field between the sample and the extractor is at the heart of cathode lenses and a crucial factor for high resolution. However, fields in the range of 3-10 kV/mm can be a source of complications. Local field enhancement at sharp edges or microscopic protrusions of cleaved samples can lead to field emission or flashovers. In addition, slow background electrons drawn into the microscope column contribute to space charge effects. A novel objective configuration, optimized by ray-tracing simulations at energies from a few eV to 6 keV, significantly reduces the field at the sample. One or more annular electrodes concentric to the extractor can shape the electric field in front of the sample. The formation of a ‘gaplens’ reduces the field to values below the 1 kV/mm range. Tuning the field to zero is advantageous for 3D structured samples. Retarding fields repel slow electrons, suppressing space charge effects. The properties of the different lens modes are investigated using ray tracing and determination of aberration coefficients. Despite its much lower electric field, the gaplens mode exhibits smaller aberrations and enables larger fields of view for both momentum and real space imaging. At electric fields as low as 1200 and 880 V/mm, the accessible solid angle interval in the gaplens mode is three times larger than in the extractor mode (with a start energy of 100 eV and a k-resolution of 10-2 Å-1). Due to the elimination of space charge effects in the retarding field mode, XPEEM resolutions in the range of 25 nm are predicted. The ray tracing results are confirmed by the spherical and chromatic aberration coefficients of the real-space and k-space images.
多模物镜动量显微镜和XPEEM:理论
样品和萃取器之间的强电场是阴极透镜的核心,也是高分辨率的关键因素。然而,在3-10 kV/mm范围内的油田可能会产生复杂问题。在切割样品的尖锐边缘或微观突起处的局部场增强可导致场发射或闪络。此外,进入显微镜柱的慢背景电子也会产生空间电荷效应。一种新的物镜结构,通过在能量从几eV到6 keV的光线追踪模拟进行优化,显着减少了样品处的场。一个或多个与萃取器同心的环形电极可以形成样品前方的电场。“间隙”的形成将电场降低到低于1kv /mm的范围。将场调到零对于三维结构样品是有利的。减速场排斥慢电子,抑制空间电荷效应。利用光线追踪和像差系数的测定研究了不同透镜模式的特性。尽管其电场要低得多,但格普伦斯模式显示出较小的像差,并为动量和实际空间成像提供了更大的视野。在低至1200和880 V/mm的电场下,gap模式下的可达立体角间隔比萃取模式(启动能量为100 eV, k分辨率为10-2 Å-1)大3倍。由于在延迟场模式中消除了空间电荷效应,预测了25 nm范围内的XPEEM分辨率。实空间和k空间图像的球差系数和色差系数证实了射线追迹的结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Ultramicroscopy
Ultramicroscopy 工程技术-显微镜技术
CiteScore
4.60
自引率
13.60%
发文量
117
审稿时长
5.3 months
期刊介绍: Ultramicroscopy is an established journal that provides a forum for the publication of original research papers, invited reviews and rapid communications. The scope of Ultramicroscopy is to describe advances in instrumentation, methods and theory related to all modes of microscopical imaging, diffraction and spectroscopy in the life and physical sciences.
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