Zixun Zhu , Jie Zhang , Junliang Wang , Peng Zhang , Jiacheng Li
{"title":"Puzzle mode graph learning with pattern composition relationships reasoning for defect detection of printed products","authors":"Zixun Zhu , Jie Zhang , Junliang Wang , Peng Zhang , Jiacheng Li","doi":"10.1016/j.jmsy.2025.05.013","DOIUrl":null,"url":null,"abstract":"<div><div>Patterns are designs composed of specific elements and are widely present in various printed products, representing particular design intentions. However, due to printing errors, pattern defects are extremely common in these products, significantly impacting their visual quality and market price, especially in high-value customized products like luxury apparel, premium wallpapers and decorative tiles. Traditional detection methods struggle to provide effective judgments with conventional visual cues purely and frequently fall short due to the intricate nature of the pattern composition. To overcome this challenge, we propose a puzzle mode graph learning method capable of reasoning about pattern composition relationships. This novel detection framework simulates the logical reasoning ability of humans in assembling unordered puzzle pieces into a complete pattern, thus surpassing spatial structure limitations and enabling structural defect detection in patterns. Specifically, a parametric representation function is integrated into convolutional layers to enhance the segmentation accuracy of shape masks. Then, cross-graph semantic matching rules are developed to dynamically re-encode the adjacency matrix, enabling the construction of an attribute relationship graph that explicitly describes pattern attributes, including pattern elements, color sequences and shape positions. Moreover, the defective reasoning mechanism calculates puzzle-mode scores to decouple semantic relationships of defect features, inferring anomalous node and edge weights affecting the graph structure, thereby facilitating more precise judgments of pattern defects. Comparative experiments conducted on a real printed defect dataset validate this method. Results demonstrate its effectiveness and robustness in identifying complex pattern defects, providing essential support for appearance quality control in high-end industrial products.</div></div>","PeriodicalId":16227,"journal":{"name":"Journal of Manufacturing Systems","volume":"81 ","pages":"Pages 34-48"},"PeriodicalIF":12.2000,"publicationDate":"2025-05-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Manufacturing Systems","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0278612525001220","RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, INDUSTRIAL","Score":null,"Total":0}
引用次数: 0
Abstract
Patterns are designs composed of specific elements and are widely present in various printed products, representing particular design intentions. However, due to printing errors, pattern defects are extremely common in these products, significantly impacting their visual quality and market price, especially in high-value customized products like luxury apparel, premium wallpapers and decorative tiles. Traditional detection methods struggle to provide effective judgments with conventional visual cues purely and frequently fall short due to the intricate nature of the pattern composition. To overcome this challenge, we propose a puzzle mode graph learning method capable of reasoning about pattern composition relationships. This novel detection framework simulates the logical reasoning ability of humans in assembling unordered puzzle pieces into a complete pattern, thus surpassing spatial structure limitations and enabling structural defect detection in patterns. Specifically, a parametric representation function is integrated into convolutional layers to enhance the segmentation accuracy of shape masks. Then, cross-graph semantic matching rules are developed to dynamically re-encode the adjacency matrix, enabling the construction of an attribute relationship graph that explicitly describes pattern attributes, including pattern elements, color sequences and shape positions. Moreover, the defective reasoning mechanism calculates puzzle-mode scores to decouple semantic relationships of defect features, inferring anomalous node and edge weights affecting the graph structure, thereby facilitating more precise judgments of pattern defects. Comparative experiments conducted on a real printed defect dataset validate this method. Results demonstrate its effectiveness and robustness in identifying complex pattern defects, providing essential support for appearance quality control in high-end industrial products.
期刊介绍:
The Journal of Manufacturing Systems is dedicated to showcasing cutting-edge fundamental and applied research in manufacturing at the systems level. Encompassing products, equipment, people, information, control, and support functions, manufacturing systems play a pivotal role in the economical and competitive development, production, delivery, and total lifecycle of products, meeting market and societal needs.
With a commitment to publishing archival scholarly literature, the journal strives to advance the state of the art in manufacturing systems and foster innovation in crafting efficient, robust, and sustainable manufacturing systems. The focus extends from equipment-level considerations to the broader scope of the extended enterprise. The Journal welcomes research addressing challenges across various scales, including nano, micro, and macro-scale manufacturing, and spanning diverse sectors such as aerospace, automotive, energy, and medical device manufacturing.