Hailong Liao , Zhiheng Fan , Chaoqi Wang , Xiulin Wu , Mingjie Lei , Yuan Pan , Xiujuan Sun , Haoran Guo , Ping Gao , Fangmin Liu , Yuwei Zhang
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引用次数: 0
Abstract
Urea oxidation reaction (UOR) is significant in reducing hydrogen production energy consumption and treating urea wastewater, necessitating the development of efficient UOR electrocatalysts. Herein, we develop a vanadium (V)-doped Ni3Fe/NiFe2O4 heterojunction (V-Ni3Fe/NiFe2O4), wherein the combined effect of V doping and the heterojunction architecture improve the material’s conductivity, facilitate electron transfer, and optimize the electronic structure of active sites. Consequently, the V-Ni3Fe/NiFe2O4 electrocatalyst requires a potential of only 1.48 V to achieve a current density of 100 mA·cm−2 and achieves ∼78 % urea degradation within 3 h. Density functional theory calculations reveal that V doping increases the density of states near the Fermi level of Ni3Fe/NiFe2O4, thereby enhancing the electron transfer capability. Moreover, the formation of the heterojunction structure improves urea adsorption and lowers the energy barrier for the UOR. This study offers valuable insights for the rational design of heterojunction-based UOR electrocatalysts.
期刊介绍:
The Journal of Colloid and Interface Science publishes original research findings on the fundamental principles of colloid and interface science, as well as innovative applications in various fields. The criteria for publication include impact, quality, novelty, and originality.
Emphasis:
The journal emphasizes fundamental scientific innovation within the following categories:
A.Colloidal Materials and Nanomaterials
B.Soft Colloidal and Self-Assembly Systems
C.Adsorption, Catalysis, and Electrochemistry
D.Interfacial Processes, Capillarity, and Wetting
E.Biomaterials and Nanomedicine
F.Energy Conversion and Storage, and Environmental Technologies