{"title":"Preparation of mesoporous CeO2@MOF-5 abrasives for efficient polishing in chemical mechanical polishing","authors":"Jia Li , Hong Lei , Ruixing Yang","doi":"10.1016/j.matchemphys.2025.130902","DOIUrl":null,"url":null,"abstract":"<div><div>In chemical mechanical polishing (CMP), abrasives play a pivotal role in determining the material removal rate (MRR) and the resulting surface quality. While traditional cerium oxide (CeO<sub>2</sub>) abrasives suffer from limitations in dispersion stability and the removal of post-polishing residues, a novel mesoporous CeO<sub>2</sub>@MOF-5 composite abrasive was developed to enhance Ce<sup>3+</sup> ion concentration for improved polishing performance. The composite abrasives were structurally characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), and transmission electron microscopy (TEM), and were found to exhibit hierarchical porosity and uniform morphology. X-ray photoelectron spectroscopy (XPS) analysis revealed an increased concentration of Ce<sup>3+</sup> ions compared to pure CeO<sub>2</sub>, which was attributed to the synergistic interaction between CeO<sub>2</sub> and the MOF-5 framework. CMP tests demonstrated that composites containing 2.00 wt% MOF-5 achieved optimal performance, attaining an MRR of 17.37 μm/h—representing a 39 % enhancement over pure CeO<sub>2</sub> abrasives (10.60 μm/h)—while simultaneously reducing the post-polishing surface roughness (Sa) to 0.31 nm, which was significantly lower than that of conventional CeO<sub>2</sub> (Sa = 1.81 nm). Wettability analysis via contact angle measurements showed enhanced slurry-substrate interactions for CeO<sub>2</sub>@MOF-5, and tribological studies revealed a higher dynamic friction coefficient that promoted increased interfacial shear stress. These combined effects enhance the mechanochemical synergy during CMP, thereby enabling both high efficiency and atomic-level surface finishing. This work offers a strategic pathway for developing next-generation composite abrasives with tunable chemical activity and mechanical robustness.</div></div>","PeriodicalId":18227,"journal":{"name":"Materials Chemistry and Physics","volume":"341 ","pages":"Article 130902"},"PeriodicalIF":4.3000,"publicationDate":"2025-04-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Chemistry and Physics","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0254058425005486","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
In chemical mechanical polishing (CMP), abrasives play a pivotal role in determining the material removal rate (MRR) and the resulting surface quality. While traditional cerium oxide (CeO2) abrasives suffer from limitations in dispersion stability and the removal of post-polishing residues, a novel mesoporous CeO2@MOF-5 composite abrasive was developed to enhance Ce3+ ion concentration for improved polishing performance. The composite abrasives were structurally characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), and transmission electron microscopy (TEM), and were found to exhibit hierarchical porosity and uniform morphology. X-ray photoelectron spectroscopy (XPS) analysis revealed an increased concentration of Ce3+ ions compared to pure CeO2, which was attributed to the synergistic interaction between CeO2 and the MOF-5 framework. CMP tests demonstrated that composites containing 2.00 wt% MOF-5 achieved optimal performance, attaining an MRR of 17.37 μm/h—representing a 39 % enhancement over pure CeO2 abrasives (10.60 μm/h)—while simultaneously reducing the post-polishing surface roughness (Sa) to 0.31 nm, which was significantly lower than that of conventional CeO2 (Sa = 1.81 nm). Wettability analysis via contact angle measurements showed enhanced slurry-substrate interactions for CeO2@MOF-5, and tribological studies revealed a higher dynamic friction coefficient that promoted increased interfacial shear stress. These combined effects enhance the mechanochemical synergy during CMP, thereby enabling both high efficiency and atomic-level surface finishing. This work offers a strategic pathway for developing next-generation composite abrasives with tunable chemical activity and mechanical robustness.
期刊介绍:
Materials Chemistry and Physics is devoted to short communications, full-length research papers and feature articles on interrelationships among structure, properties, processing and performance of materials. The Editors welcome manuscripts on thin films, surface and interface science, materials degradation and reliability, metallurgy, semiconductors and optoelectronic materials, fine ceramics, magnetics, superconductors, specialty polymers, nano-materials and composite materials.