Preparation of mesoporous CeO2@MOF-5 abrasives for efficient polishing in chemical mechanical polishing

IF 4.3 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Jia Li , Hong Lei , Ruixing Yang
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Abstract

In chemical mechanical polishing (CMP), abrasives play a pivotal role in determining the material removal rate (MRR) and the resulting surface quality. While traditional cerium oxide (CeO2) abrasives suffer from limitations in dispersion stability and the removal of post-polishing residues, a novel mesoporous CeO2@MOF-5 composite abrasive was developed to enhance Ce3+ ion concentration for improved polishing performance. The composite abrasives were structurally characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), and transmission electron microscopy (TEM), and were found to exhibit hierarchical porosity and uniform morphology. X-ray photoelectron spectroscopy (XPS) analysis revealed an increased concentration of Ce3+ ions compared to pure CeO2, which was attributed to the synergistic interaction between CeO2 and the MOF-5 framework. CMP tests demonstrated that composites containing 2.00 wt% MOF-5 achieved optimal performance, attaining an MRR of 17.37 μm/h—representing a 39 % enhancement over pure CeO2 abrasives (10.60 μm/h)—while simultaneously reducing the post-polishing surface roughness (Sa) to 0.31 nm, which was significantly lower than that of conventional CeO2 (Sa = 1.81 nm). Wettability analysis via contact angle measurements showed enhanced slurry-substrate interactions for CeO2@MOF-5, and tribological studies revealed a higher dynamic friction coefficient that promoted increased interfacial shear stress. These combined effects enhance the mechanochemical synergy during CMP, thereby enabling both high efficiency and atomic-level surface finishing. This work offers a strategic pathway for developing next-generation composite abrasives with tunable chemical activity and mechanical robustness.
化学机械抛光中高效抛光用介孔CeO2@MOF-5磨料的制备
在化学机械抛光(CMP)中,磨料在决定材料去除率(MRR)和产生的表面质量方面起着关键作用。针对传统氧化铈(CeO2)磨料在分散稳定性和去除抛光后残留物方面的局限性,开发了一种新型介孔CeO2@MOF-5复合磨料,以提高Ce3+离子浓度,提高抛光性能。利用x射线衍射(XRD)、扫描电子显微镜(SEM)和透射电子显微镜(TEM)对复合磨料进行了结构表征,发现复合磨料具有分层孔隙度和均匀的形貌。x射线光电子能谱(XPS)分析表明,与纯CeO2相比,Ce3+离子浓度增加,这是由于CeO2与MOF-5框架之间的协同相互作用。CMP测试表明,含有2.00 wt% MOF-5的复合材料获得了最佳性能,MRR达到17.37 μm/h,比纯CeO2磨料(10.60 μm/h)提高了39%,同时将抛光后表面粗糙度(Sa)降低到0.31 nm,显著低于常规CeO2 (Sa = 1.81 nm)。通过接触角测量进行的润湿性分析表明,CeO2@MOF-5的浆料-基质相互作用增强,摩擦学研究表明,更高的动态摩擦系数促进了界面剪切应力的增加。这些综合效应增强了CMP过程中的机械化学协同作用,从而实现了高效率和原子级表面处理。这项工作为开发具有可调化学活性和机械坚固性的下一代复合磨料提供了战略途径。
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来源期刊
Materials Chemistry and Physics
Materials Chemistry and Physics 工程技术-材料科学:综合
CiteScore
8.70
自引率
4.30%
发文量
1515
审稿时长
69 days
期刊介绍: Materials Chemistry and Physics is devoted to short communications, full-length research papers and feature articles on interrelationships among structure, properties, processing and performance of materials. The Editors welcome manuscripts on thin films, surface and interface science, materials degradation and reliability, metallurgy, semiconductors and optoelectronic materials, fine ceramics, magnetics, superconductors, specialty polymers, nano-materials and composite materials.
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