Temperature control system based on Active Disturbance Rejection Control and its parameter optimization in large-sized monolithic silicon epitaxy equipment reactor
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引用次数: 0
Abstract
The temperature regulation of large-sized monolithic silicon epitaxial reactors presents a significant technical challenge, primarily attributed to its nonlinearities, significant time delays, and cross-regional coupling interference within the multi-zone heating process. To speed up the heating process while minimizing overshoot, this paper proposes a temperature control system based on Active Disturbance Rejection Control (ADRC). Additionally, this paper proposes a parameter optimization method based on orthogonal experimental design. The ADRC controller's parameters were optimized in the Simulink simulation model, and the controller's performance in temperature control was compared to that of the conventional PID controller following the same parameter optimization. The simulation results demonstrate that under the condition of maintaining overshoot within 1 % of the setting value, the ADRC-based temperature control system achieves stabilization within the ± 1 % error band of the setting value in 53.42 % of the time required by the PID-based temperature control system. Finally, experiments prove that the temperature control system with ADRC controllers can implement precise temperature control and shows good temperature control performance.
期刊介绍:
This international journal covers the application of control theory, operations research, computer science and engineering principles to the solution of process control problems. In addition to the traditional chemical processing and manufacturing applications, the scope of process control problems involves a wide range of applications that includes energy processes, nano-technology, systems biology, bio-medical engineering, pharmaceutical processing technology, energy storage and conversion, smart grid, and data analytics among others.
Papers on the theory in these areas will also be accepted provided the theoretical contribution is aimed at the application and the development of process control techniques.
Topics covered include:
• Control applications• Process monitoring• Plant-wide control• Process control systems• Control techniques and algorithms• Process modelling and simulation• Design methods
Advanced design methods exclude well established and widely studied traditional design techniques such as PID tuning and its many variants. Applications in fields such as control of automotive engines, machinery and robotics are not deemed suitable unless a clear motivation for the relevance to process control is provided.