Enhanced tunnel electroresistance in BAs/In2S3 ferroelectric tunnel junction through ferroelectric control of band alignments

IF 3.1 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Ruixue Li , Sicong Zhu , Jun Ding
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Abstract

We have designed two-dimensional ferroelectric tunnel junctions (FTJs) utilizing BAs/In2S3 van der Waals heterostructures and explored their transport characteristics. At low bias voltage, a pronounced difference in current magnitudes under different polarization states is observed, leading to a giant tunneling electroresistance (TER) ratio of 108%. Analysis of the projected band structures reveals changes in band alignment from type-III to type-I under the ferroelectric polarization reversal. Further discussions indicate that polarization reversal can cause a variation in the total charge transfer, consequently altering the Fermi level’s position in the BAs and In2S3 layers. This alteration results in a transition between metallic and semiconducting states, thus achieving a high TER ratio. These findings imply great potential of high-performance 2D FTJs, which may contribute to the development of non-volatile storage devices and ferroelectric field-effect transistors.

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来源期刊
Computational Materials Science
Computational Materials Science 工程技术-材料科学:综合
CiteScore
6.50
自引率
6.10%
发文量
665
审稿时长
26 days
期刊介绍: The goal of Computational Materials Science is to report on results that provide new or unique insights into, or significantly expand our understanding of, the properties of materials or phenomena associated with their design, synthesis, processing, characterization, and utilization. To be relevant to the journal, the results should be applied or applicable to specific material systems that are discussed within the submission.
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