Spatial Characteristics of Arc Discharge Plasma in Relation to the Synthesis of Silicon Nanostructures

IF 1.1 4区 物理与天体物理 Q4 PHYSICS, APPLIED
A. A. Kaleeva, B. A. Timerkaev, O. A. Petrova, A. A. Saifutdinova
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引用次数: 0

Abstract

The paper presents an arc discharge model as applied to the synthesis problems of semiconductor nanostructures. The model is based on a completely nonequilibrium approximation and includes charged particle density balance equations, electron energy balance and energy balance equation for the heavy component of plasma, and Poisson’s equations for describing a self-consistent electric field. As a result of a numerical study of the system of equations describing an electric arc discharge, spatial distributions of the main characteristics of an arc discharge, such as the potential and intensity of the electric field, densities of electrons and ions, and gas temperatures were obtained.

Abstract Image

本文介绍了一种应用于半导体纳米结构合成问题的电弧放电模型。该模型基于完全非平衡近似,包括带电粒子密度平衡方程、电子能量平衡和等离子体重组分能量平衡方程,以及用于描述自洽电场的泊松方程。通过对描述电弧放电的方程系统进行数值研究,获得了电弧放电主要特征的空间分布,如电场的电势和强度、电子和离子密度以及气体温度。
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来源期刊
Technical Physics
Technical Physics 物理-物理:应用
CiteScore
1.30
自引率
14.30%
发文量
139
审稿时长
3-6 weeks
期刊介绍: Technical Physics is a journal that contains practical information on all aspects of applied physics, especially instrumentation and measurement techniques. Particular emphasis is put on plasma physics and related fields such as studies of charged particles in electromagnetic fields, synchrotron radiation, electron and ion beams, gas lasers and discharges. Other journal topics are the properties of condensed matter, including semiconductors, superconductors, gases, liquids, and different materials.
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