Bi-directional LEEM and eV-TEM spectroscopy on a graphene-hBN heterostack

IF 2.1 3区 工程技术 Q2 MICROSCOPY
Peter S. Neu , Eugene E. Krasovskii , Rudolf M. Tromp , Sense Jan van der Molen
{"title":"Bi-directional LEEM and eV-TEM spectroscopy on a graphene-hBN heterostack","authors":"Peter S. Neu ,&nbsp;Eugene E. Krasovskii ,&nbsp;Rudolf M. Tromp ,&nbsp;Sense Jan van der Molen","doi":"10.1016/j.ultramic.2025.114117","DOIUrl":null,"url":null,"abstract":"<div><div>Van der Waals heterostacks can exhibit emergent properties as a result of the coupling between the individual layers stacked. Here we focus on heterostacks of graphene and hBN, and study both coherent electron resonances (or unoccupied states) and inelastic losses. For this, we measure electron reflection and transmission spectra of the stack, as a function of electron energy. Special attention is paid to the symmetry upon flipping the heterostack, i.e., whether the electrons are first incident on the graphene or on the hBN surface: whereas electron reflection may be sensitive to sample orientation, electron transmission should not. Experimentally, we compare LEEM (reflection) and eV-TEM (transmission) IV spectra measured on free-standing graphene-hBN heterostacks with either the graphene or hBN side facing the LEEM objective lens. Resonances and inelastic loss are first modeled with the help of a simple wave interference toy model inspired by optics. More advanced calculations are performed to obtain the spatially resolved density of unoccupied states in the heterostack. We relate these calculations to the measured spectra, taking into account the finite probing depth of the reflected electron beam.</div></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"271 ","pages":"Article 114117"},"PeriodicalIF":2.1000,"publicationDate":"2025-02-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Ultramicroscopy","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0304399125000166","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MICROSCOPY","Score":null,"Total":0}
引用次数: 0

Abstract

Van der Waals heterostacks can exhibit emergent properties as a result of the coupling between the individual layers stacked. Here we focus on heterostacks of graphene and hBN, and study both coherent electron resonances (or unoccupied states) and inelastic losses. For this, we measure electron reflection and transmission spectra of the stack, as a function of electron energy. Special attention is paid to the symmetry upon flipping the heterostack, i.e., whether the electrons are first incident on the graphene or on the hBN surface: whereas electron reflection may be sensitive to sample orientation, electron transmission should not. Experimentally, we compare LEEM (reflection) and eV-TEM (transmission) IV spectra measured on free-standing graphene-hBN heterostacks with either the graphene or hBN side facing the LEEM objective lens. Resonances and inelastic loss are first modeled with the help of a simple wave interference toy model inspired by optics. More advanced calculations are performed to obtain the spatially resolved density of unoccupied states in the heterostack. We relate these calculations to the measured spectra, taking into account the finite probing depth of the reflected electron beam.
石墨烯- hbn异质堆的双向LEEM和eV-TEM光谱研究
范德瓦尔斯异质堆栈会因单层堆栈之间的耦合而表现出新的特性。在此,我们重点研究石墨烯和氢溴萘的异质堆栈,并同时研究相干电子共振(或未占据态)和非弹性损耗。为此,我们测量了叠层的电子反射和透射光谱与电子能量的函数关系。我们特别关注翻转异质堆栈时的对称性,即电子是首先入射到石墨烯上还是hBN表面:电子反射可能对样品取向敏感,而电子透射则不敏感。在实验中,我们比较了在独立的石墨烯-卤化硼异质堆上测量到的 LEEM(反射)和 eV-TEM(透射)IV 光谱,石墨烯或卤化硼一侧均朝向 LEEM 物镜。共振和非弹性损耗首先借助一个受光学启发的简单波干涉玩具模型进行建模。我们还进行了更先进的计算,以获得异质堆栈中未占据状态的空间分辨密度。考虑到反射电子束的探测深度有限,我们将这些计算与测量光谱联系起来。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
Ultramicroscopy
Ultramicroscopy 工程技术-显微镜技术
CiteScore
4.60
自引率
13.60%
发文量
117
审稿时长
5.3 months
期刊介绍: Ultramicroscopy is an established journal that provides a forum for the publication of original research papers, invited reviews and rapid communications. The scope of Ultramicroscopy is to describe advances in instrumentation, methods and theory related to all modes of microscopical imaging, diffraction and spectroscopy in the life and physical sciences.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信