DPF-Bi-RRT*: An Improved Path Planning Algorithm for Complex 3D Environments With Adaptive Sampling and Dual Potential Field Strategy

IF 3.4 3区 计算机科学 Q2 COMPUTER SCIENCE, INFORMATION SYSTEMS
Lin Ge;Swee King Phang;Nohaidda Sariff
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Abstract

This research work, we introduce a path planning algorithm called DPF-Bi-RRT* which integrates a Dual Potential Field mechanism with a Targeted Sampling Strategy to address path planning issues in complex 3D spaces. The algorithm achieves a good trade off between the global path optimization and precise local obstacle avoidance by combining dual-attraction and dual-repulsion mechanisms. The algorithm achieves effective exploration of path regions of high quality by dynamically adjusting the sampling distribution. Additionally, a biased random sampling strategy improves computational efficiency by directing sampling resources toward sections with higher promise of optimal paths, dramatically reducing computational cost. The dual potential field model lead to more flexible method in collision avoidance and can improve the precision of collision avoidance, especially in cluttered dynamical spaces. We perform comparative simulations of DPF-Bi-RRT* versus RRT*, Bi-RRT*, and APF-Bi-RRT* across three defined environments to demonstrate that DPF-Bi-RRT* results in lower average node counts, less computational time, and longer path lengths than all three. Results validate its capability of generating smooth, collision free and globally optimized paths making it especially suitable for autonomous aerial vehicle (AAV) navigation in complex 3D environments.
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来源期刊
IEEE Access
IEEE Access COMPUTER SCIENCE, INFORMATION SYSTEMSENGIN-ENGINEERING, ELECTRICAL & ELECTRONIC
CiteScore
9.80
自引率
7.70%
发文量
6673
审稿时长
6 weeks
期刊介绍: IEEE Access® is a multidisciplinary, open access (OA), applications-oriented, all-electronic archival journal that continuously presents the results of original research or development across all of IEEE''s fields of interest. IEEE Access will publish articles that are of high interest to readers, original, technically correct, and clearly presented. Supported by author publication charges (APC), its hallmarks are a rapid peer review and publication process with open access to all readers. Unlike IEEE''s traditional Transactions or Journals, reviews are "binary", in that reviewers will either Accept or Reject an article in the form it is submitted in order to achieve rapid turnaround. Especially encouraged are submissions on: Multidisciplinary topics, or applications-oriented articles and negative results that do not fit within the scope of IEEE''s traditional journals. Practical articles discussing new experiments or measurement techniques, interesting solutions to engineering. Development of new or improved fabrication or manufacturing techniques. Reviews or survey articles of new or evolving fields oriented to assist others in understanding the new area.
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