Computed libraries of avobenzone derivatives with sulfur groups as enhanced UVA filters

IF 2.1 4区 化学 Q4 BIOCHEMISTRY & MOLECULAR BIOLOGY
Deepak Kumar Sahoo, Smriti Moi, Konkallu Hanumae Gowd
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Abstract

Context

Sunscreen formulations often contain avobenzone as a UVA filter to combat the deleterious effects of solar UV radiation. Avobenzone has notable drawbacks: (1) photounstability under UV radiation/sunlight and (2) tendency for skin penetration. The current report aims to improve both the intrinsic photostability and decrease the skin permeability of avobenzone through skeleton structure modification. The electron-donating -OMe group of avobenzone was replaced with diverse groups to compute molecular libraries of avobenzone derivatives. The studies were focused on the sulfur electron-withdrawing groups of avobenzone derivatives as the photostable UV filters contain –SO3H groups. The UV spectra and bond dissociation energy of Norrish type I cleavages were computed using density functional theory (DFT). The tendency for skin permeability was evaluated by calculating transdermal transportation rate and membrane permeability.

Methods

A total of 2468 avobenzone derivatives were computed using the enumeration tool of the Schrödinger Material Suite platform. Searching for sulfur-containing derivatives yielded a total of 72 molecules, 23 of which exhibited electron-withdrawing properties. These molecules were evaluated for their UVA spectra using TDDFT with the B3LYP functional and a 6-311G + ** basis set. The bond dissociation energy for putative Norrish type I cleavages was calculated using the B3LYP functional in combination with the LACV3P** basis set. The membrane dG insert was calculated using the membrane permeability panel. The maximum transdermal transportation rate (Jm) was derived using the QikProp tool. These results indicate that avobenzone derivatives with sulfonic acid, sulfuric diamide, and sulfonamide functional groups demonstrated improved photochemical properties with a significant reduction in skin permeability compared to the native avobenzone.

Graphical Abstract

含硫基阿伏苯宗衍生物增强UVA过滤器的计算文库
防晒霜配方通常含有阿伏苯宗作为UVA过滤器,以对抗太阳紫外线辐射的有害影响。阿伏苯宗有明显的缺点:(1)紫外线辐射/阳光下的光不稳定性;(2)皮肤渗透的倾向。本报告旨在通过改变阿伏苯宗的骨架结构来提高其固有的光稳定性并降低其透皮性。用不同基团取代阿伏苯宗的给电子-OMe基团,计算阿伏苯宗衍生物的分子文库。主要研究了阿伏苯宗衍生物的硫吸电子基团,因为其光稳定紫外滤光剂中含有-SO3H基团。利用密度泛函理论(DFT)计算了Norrish I型裂解的紫外光谱和键解离能。通过计算透皮运输速率和膜透性来评价皮肤透性的趋势。方法利用Schrödinger Material Suite平台的计数工具,计算阿伏苯宗衍生物2468个。搜索含硫衍生物共得到72个分子,其中23个具有吸电子特性。利用B3LYP泛函和6-311G + **基集的TDDFT对这些分子的UVA光谱进行了评估。使用B3LYP泛函结合LACV3P**基集计算了假定的Norrish I型裂解的键解离能。利用膜渗透性面板计算膜dG插入量。使用QikProp工具计算最大透皮转运率(Jm)。这些结果表明,与天然阿伏苯宗相比,具有磺酸、硫酸二胺和磺酰胺官能团的阿伏苯宗衍生物表现出改善的光化学性质,显著降低皮肤渗透性。图形抽象
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来源期刊
Journal of Molecular Modeling
Journal of Molecular Modeling 化学-化学综合
CiteScore
3.50
自引率
4.50%
发文量
362
审稿时长
2.9 months
期刊介绍: The Journal of Molecular Modeling focuses on "hardcore" modeling, publishing high-quality research and reports. Founded in 1995 as a purely electronic journal, it has adapted its format to include a full-color print edition, and adjusted its aims and scope fit the fast-changing field of molecular modeling, with a particular focus on three-dimensional modeling. Today, the journal covers all aspects of molecular modeling including life science modeling; materials modeling; new methods; and computational chemistry. Topics include computer-aided molecular design; rational drug design, de novo ligand design, receptor modeling and docking; cheminformatics, data analysis, visualization and mining; computational medicinal chemistry; homology modeling; simulation of peptides, DNA and other biopolymers; quantitative structure-activity relationships (QSAR) and ADME-modeling; modeling of biological reaction mechanisms; and combined experimental and computational studies in which calculations play a major role.
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