Influences of composite additives and technological parameters on the microstructure and properties of electrolytic copper foil Einfluss von Verbundwerkstoffzusätzen und technologischen Parametern auf das Gefüge und die Eigenschaften von elektrolytischer Kupferfolie

IF 1.2 4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY
B. Zhang, W. C. Sun, E. Y. Liu, Y. F. Xu, M. R. Zhou, H. Cai, J. L. Zhang, T. Z. Jia
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Abstract

In this paper, the additives consisting of bis-(3-sulfopropyl)-disulfide, hydroxyethylcellulose and collagen additive compounding are used to fabricate ultra-thin copper foils with low roughness on titanium substrates. The results show that the deposited layers obtained at the electrodeposition time of 3 min, the electrolyte temperature of 50 °C and the output voltage of 2.5 V exhibit small grain size and good adhesion to the substrate. Meanwhile, the effects of the two-component additive and the three-component additive on the microstructures, surface roughness and electrochemical behavior of copper foils are studied. The x-ray diffraction results reveal that copper foils prepared by simultaneous introduction of 0.06 g/L bis-(3-sulfopropyl)-disulfide and 0.08 g/L collagen possess a dense and homogeneous structure with the smallest grain size and the lowest roughness, which is diminished by 26.17 %. The electrochemical results indicated that the SC additive had an inhibitory effect on the deposition of copper ions, while the SH additive exerted depolarizing effect in this electrolyte system, accelerating the deposition of copper particles, which was attributed to the antagonistic interaction between bis-(3-sulfopropyl)-disulfide and hydroxyethylcellulose that hindered the preferential adsorption of the additive at the surface protrusions, resulting in the decrease in the refinement effect of the bis-(3-sulfopropyl)-disulfide additive. Under the optimized process parameters, the increase in the deposition rate of Cu2+ balances the relationship between nucleation and growth of copper ions, which ultimately produces the copper foil with smooth surface and low roughness.

Abstract Image

复合材料添加剂和技术参数对电解铜箔微观结构和性能的影响
本文采用双-(3-磺基丙基)-二硫化物、羟乙基纤维素和胶原复合添加剂组成的添加剂,在钛基上制备了低粗糙度的超薄铜箔。结果表明:在电沉积时间为3 min、电解液温度为50℃、输出电压为2.5 V的条件下,沉积得到的镀层晶粒尺寸小,与衬底的附着力好;同时,研究了双组分添加剂和三组分添加剂对铜箔微观组织、表面粗糙度和电化学行为的影响。x射线衍射结果表明,同时加入0.06 g/L双-(3-亚砜丙基)-二硫化物和0.08 g/L胶原制备的铜箔结构致密均匀,晶粒尺寸最小,粗糙度降低26.17%。电化学结果表明,SC添加剂对铜离子的沉积具有抑制作用,而SH添加剂在该电解质体系中具有去极化作用,加速了铜粒子的沉积,这是由于双-(3-磺丙基)-二硫化物与羟乙基纤维素之间的拮抗作用阻碍了添加剂在表面突起处的优先吸附。导致双-(3-磺丙基)-二硫化添加剂的细化效果下降。在优化的工艺参数下,Cu2+沉积速率的提高平衡了铜离子的成核与生长之间的关系,最终得到表面光滑、粗糙度低的铜箔。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Materialwissenschaft und Werkstofftechnik
Materialwissenschaft und Werkstofftechnik 工程技术-材料科学:综合
CiteScore
2.10
自引率
9.10%
发文量
154
审稿时长
4-8 weeks
期刊介绍: Materialwissenschaft und Werkstofftechnik provides fundamental and practical information for those concerned with materials development, manufacture, and testing. Both technical and economic aspects are taken into consideration in order to facilitate choice of the material that best suits the purpose at hand. Review articles summarize new developments and offer fresh insight into the various aspects of the discipline. Recent results regarding material selection, use and testing are described in original articles, which also deal with failure treatment and investigation. Abstracts of new publications from other journals as well as lectures presented at meetings and reports about forthcoming events round off the journal.
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