{"title":"Highly textured AlN films deposited by pulsed DC magnetron sputtering with optimized process parameters","authors":"V.R. Shayapov , A.L. Bogoslovtseva , S. Yu Chepkasov , A.V. Kapishnikov , M.I. Mironova , P.V. Geydt","doi":"10.1016/j.ssc.2024.115821","DOIUrl":null,"url":null,"abstract":"<div><div>The work is oriented towards finding the optimal process parameters of growth of polycrystalline AlN films by pulsed DC magnetron sputtering. The nitrogen concentration varied from 10 to 40 %, total flow of Ar/N<sub>2</sub> gas mixture varied from 60 to 120 sccm, substrate temperatures were 100, 200 and 300 °C. X-ray diffraction, atomic force microscopy, high resolution transmission electron microscopy, scanning electron microscopy with energy dispersive X-ray spectroscopy selected area electron diffraction and ellipsometry methods were applied for AlN films characterization. The transition layer at the film-substrate interface was investigated and its polycrystalline structure without preferred crystallite texture was confirmed. Correlations of deposition parameters and films’ texture, mechanical stresses, roughness, elemental and phase composition were found. As a result, optimal deposition parameters were selected to obtain highly textured along <em>c</em>-axis AlN films with reasonable growth rate, low roughness and minimum level of macro- and microstresses.</div></div>","PeriodicalId":430,"journal":{"name":"Solid State Communications","volume":"397 ","pages":"Article 115821"},"PeriodicalIF":2.1000,"publicationDate":"2024-12-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Solid State Communications","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0038109824003983","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, CONDENSED MATTER","Score":null,"Total":0}
引用次数: 0
Abstract
The work is oriented towards finding the optimal process parameters of growth of polycrystalline AlN films by pulsed DC magnetron sputtering. The nitrogen concentration varied from 10 to 40 %, total flow of Ar/N2 gas mixture varied from 60 to 120 sccm, substrate temperatures were 100, 200 and 300 °C. X-ray diffraction, atomic force microscopy, high resolution transmission electron microscopy, scanning electron microscopy with energy dispersive X-ray spectroscopy selected area electron diffraction and ellipsometry methods were applied for AlN films characterization. The transition layer at the film-substrate interface was investigated and its polycrystalline structure without preferred crystallite texture was confirmed. Correlations of deposition parameters and films’ texture, mechanical stresses, roughness, elemental and phase composition were found. As a result, optimal deposition parameters were selected to obtain highly textured along c-axis AlN films with reasonable growth rate, low roughness and minimum level of macro- and microstresses.
期刊介绍:
Solid State Communications is an international medium for the publication of short communications and original research articles on significant developments in condensed matter science, giving scientists immediate access to important, recently completed work. The journal publishes original experimental and theoretical research on the physical and chemical properties of solids and other condensed systems and also on their preparation. The submission of manuscripts reporting research on the basic physics of materials science and devices, as well as of state-of-the-art microstructures and nanostructures, is encouraged.
A coherent quantitative treatment emphasizing new physics is expected rather than a simple accumulation of experimental data. Consistent with these aims, the short communications should be kept concise and short, usually not longer than six printed pages. The number of figures and tables should also be kept to a minimum. Solid State Communications now also welcomes original research articles without length restrictions.
The Fast-Track section of Solid State Communications is the venue for very rapid publication of short communications on significant developments in condensed matter science. The goal is to offer the broad condensed matter community quick and immediate access to publish recently completed papers in research areas that are rapidly evolving and in which there are developments with great potential impact.