{"title":"Electrochemical Oxidative Desorption of Adsorbed Sulfur Species on (111) Surfaces of Single Crystals of Pure Pt and Pt-Based Bimetallic Alloys","authors":"Makoto Aoki, Tamao Shishido, Tetsuro Morooka, Takuya Nakanishi, Takuya Masuda","doi":"10.1021/acs.jpcc.4c06652","DOIUrl":null,"url":null,"abstract":"The adsorption/desorption behavior of sulfur species at the (111) surfaces of pure Pt and various Pt-based bimetallic alloys, denoted as Pt<sub>3</sub>M (M = Co, Cu, Fe, Pd), was investigated by electrochemical measurements and X-ray photoelectron spectroscopy (XPS). After the adsorption of elemental sulfur, the current responses characteristic of the adsorption/desorption of hydrogen and hydroxyl species at the sulfur-free bare (111) surfaces completely disappeared, and a doublet peak corresponding to the elemental sulfur appeared in the S 2p region of XPS spectra. The characteristic current responses gradually recovered, simultaneously with the decrease of the S 2p peak, by repeating the potential cycling between −0.2 and 0.8 V vs Ag/AgCl, indicating the oxidative desorption of S species. Except for the Pt<sub>3</sub>Pd(111) surface, in which Pd has a similar atomic radius to Pt and fully occupied 4d orbitals, the Pt<sub>3</sub>M(111) surfaces showed higher oxidative desorption capability than those of the pure Pt(111) surface; electrochemically active surface area recovered at the Pt<sub>3</sub>M(111) surfaces by fewer potential cycles than at the Pt(111) surface. Among the various factors, the downshift of the d-band center due to the ligand effect of foreign metal and the electronic interaction between adsorbed S and Pt are the dominant factors promoting the oxidative desorption of sulfur as well as the strain effect of foreign metal with an atomic radius smaller than Pt.","PeriodicalId":61,"journal":{"name":"The Journal of Physical Chemistry C","volume":"22 1","pages":""},"PeriodicalIF":3.3000,"publicationDate":"2025-01-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"The Journal of Physical Chemistry C","FirstCategoryId":"1","ListUrlMain":"https://doi.org/10.1021/acs.jpcc.4c06652","RegionNum":3,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0
Abstract
The adsorption/desorption behavior of sulfur species at the (111) surfaces of pure Pt and various Pt-based bimetallic alloys, denoted as Pt3M (M = Co, Cu, Fe, Pd), was investigated by electrochemical measurements and X-ray photoelectron spectroscopy (XPS). After the adsorption of elemental sulfur, the current responses characteristic of the adsorption/desorption of hydrogen and hydroxyl species at the sulfur-free bare (111) surfaces completely disappeared, and a doublet peak corresponding to the elemental sulfur appeared in the S 2p region of XPS spectra. The characteristic current responses gradually recovered, simultaneously with the decrease of the S 2p peak, by repeating the potential cycling between −0.2 and 0.8 V vs Ag/AgCl, indicating the oxidative desorption of S species. Except for the Pt3Pd(111) surface, in which Pd has a similar atomic radius to Pt and fully occupied 4d orbitals, the Pt3M(111) surfaces showed higher oxidative desorption capability than those of the pure Pt(111) surface; electrochemically active surface area recovered at the Pt3M(111) surfaces by fewer potential cycles than at the Pt(111) surface. Among the various factors, the downshift of the d-band center due to the ligand effect of foreign metal and the electronic interaction between adsorbed S and Pt are the dominant factors promoting the oxidative desorption of sulfur as well as the strain effect of foreign metal with an atomic radius smaller than Pt.
期刊介绍:
The Journal of Physical Chemistry A/B/C is devoted to reporting new and original experimental and theoretical basic research of interest to physical chemists, biophysical chemists, and chemical physicists.