Removal of gaseous Hg0 by Cl-loaded carbonaceous material prepared from rice husk

IF 3.4 3区 化学 Q2 CHEMISTRY, MULTIDISCIPLINARY
Naoto Tsubouchi, Momone Yoshizawa, Javzandogole Bud and Yuuki Mochizuki
{"title":"Removal of gaseous Hg0 by Cl-loaded carbonaceous material prepared from rice husk","authors":"Naoto Tsubouchi, Momone Yoshizawa, Javzandogole Bud and Yuuki Mochizuki","doi":"10.1039/D4RE00414K","DOIUrl":null,"url":null,"abstract":"<p >The main objective of this study was to investigate the removal of gaseous Hg<small><sup>0</sup></small> from the residue obtained during the chlorination of rice husk char to recover silica. First, the chlorine content, chlorine form, pore size, and chlorination reaction of the chlorination residue of rice husk char were investigated. Subsequently, the adsorption performance of gaseous Hg<small><sup>0</sup></small> and adsorption form of Hg<small><sup>0</sup></small> were examined. Through the chlorination of rice husk char (RC) at 1000 °C for 10 min, silicon (Si) in the char could be separated and recovered, and carbonaceous material doped with 9.0% Cl could be prepared. The temperature-programmed desorption (TPD) analysis of the char before and after chlorination revealed that the oxygen-containing functional groups on the surface of char were part of the Cl adsorption sites. Additionally, the X-ray photoelectron spectroscopy (XPS) analysis showed that Cl was mainly present in the C–Cl bonds of the chlorination residue (RCC). The effect of temperature on the performance was small in the tested range (40–160 °C). The adsorption performance of the prepared RCC was superior to those of chlorine- and sulfur-loaded carbons, as reported in previous studies. The results of TPD analysis after the adsorption tests indicated that the adsorption form of Hg<small><sup>0</sup></small> was mainly HgCl<small><sub>2</sub></small>.</p>","PeriodicalId":101,"journal":{"name":"Reaction Chemistry & Engineering","volume":" 1","pages":" 158-167"},"PeriodicalIF":3.4000,"publicationDate":"2024-10-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Reaction Chemistry & Engineering","FirstCategoryId":"92","ListUrlMain":"https://pubs.rsc.org/en/content/articlelanding/2025/re/d4re00414k","RegionNum":3,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

The main objective of this study was to investigate the removal of gaseous Hg0 from the residue obtained during the chlorination of rice husk char to recover silica. First, the chlorine content, chlorine form, pore size, and chlorination reaction of the chlorination residue of rice husk char were investigated. Subsequently, the adsorption performance of gaseous Hg0 and adsorption form of Hg0 were examined. Through the chlorination of rice husk char (RC) at 1000 °C for 10 min, silicon (Si) in the char could be separated and recovered, and carbonaceous material doped with 9.0% Cl could be prepared. The temperature-programmed desorption (TPD) analysis of the char before and after chlorination revealed that the oxygen-containing functional groups on the surface of char were part of the Cl adsorption sites. Additionally, the X-ray photoelectron spectroscopy (XPS) analysis showed that Cl was mainly present in the C–Cl bonds of the chlorination residue (RCC). The effect of temperature on the performance was small in the tested range (40–160 °C). The adsorption performance of the prepared RCC was superior to those of chlorine- and sulfur-loaded carbons, as reported in previous studies. The results of TPD analysis after the adsorption tests indicated that the adsorption form of Hg0 was mainly HgCl2.

Abstract Image

用稻壳制备的含氯碳质材料去除气态 Hg0
本研究的主要目的是调查稻壳炭氯化回收二氧化硅过程中残留物中气态 Hg0 的去除情况。首先,研究了稻壳炭氯化残渣的氯含量、氯形式、孔径和氯化反应。随后,研究了气态 Hg0 的吸附性能和 Hg0 的吸附形式。稻壳炭(RC)在 1000 °C 下氯化 10 分钟后,炭中的硅(Si)得以分离和回收,并制备出掺有 9.0% Cl 的炭质材料。对氯化前后的炭进行温度编程解吸(TPD)分析表明,炭表面的含氧官能团是 Cl 吸附位点的一部分。此外,X 射线光电子能谱(XPS)分析表明,Cl 主要存在于氯化残渣(RCC)的 C-Cl 键中。在测试范围(40-160 °C)内,温度对性能的影响较小。制备的 RCC 的吸附性能优于以往研究中报道的含氯和含硫碳。吸附试验后的 TPD 分析结果表明,Hg0 的吸附形式主要是 HgCl2。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
Reaction Chemistry & Engineering
Reaction Chemistry & Engineering Chemistry-Chemistry (miscellaneous)
CiteScore
6.60
自引率
7.70%
发文量
227
期刊介绍: Reaction Chemistry & Engineering is a new journal reporting cutting edge research into all aspects of making molecules for the benefit of fundamental research, applied processes and wider society. From fundamental, molecular-level chemistry to large scale chemical production, Reaction Chemistry & Engineering brings together communities of chemists and chemical engineers working to ensure the crucial role of reaction chemistry in today’s world.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信