Study of SERS activity of different gold nanostructures prepared by electron beam lithography

IF 3.4 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Hao Li, Gen Liu, Yi Zhang, Luzhen Hao, Pinggen Zou, Yuchen Xu, Mei Ji, Xue Yu, Jiangli Li, Yanqing Ma, Lei Ma
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引用次数: 0

Abstract

Plasmonic metal nanostructure prepared by photolithography technology can be used as a uniform and stable substrate with high SERS activity. However, there is only limited research on the precisely regulated metal nanostructures and the systematic studies on the relation between the structure and SERS response. Herein, different gold nanostructure arrays (including circles, equilateral triangles, squares, regular pentagons, regular hexagons, pentagrams, and hexagram) have been prepared using electron beam lithography (EBL). Rhodamine B were employed as the probe molecule. The effect of the shapes, sizes (s), spacing (d), and rotation angle (α) of different shapes gold on SERS activities were systematically investigated under the excitation of 532 nm laser. Further finite element method based electromagnetic field simulations unveiled the correlation between the local electromagnetic field strengths and the SERS activities, which also verified the proportional relation between the fourth power of the electromagnetic field intensity (LE) and enhancement factor (EF).

电子束光刻制备不同金纳米结构的SERS活性研究
利用光刻技术制备的等离子体金属纳米结构可作为均匀稳定、具有高SERS活性的衬底。然而,对于精确调控的金属纳米结构,以及结构与SERS响应关系的系统研究还比较有限。本文利用电子束光刻技术(EBL)制备了不同的金纳米结构阵列(圆形、等边三角形、正方形、正五边形、正六边形、五角形和六角形)。罗丹明B作为探针分子。在532 nm激光激发下,系统研究了不同形状金的形状、尺寸(s)、间距(d)和旋转角度(α)对SERS活性的影响。基于有限元法的电磁场模拟进一步揭示了局部电磁场强度与SERS活性之间的相关关系,验证了电磁场强度(LE)的四次方与增强因子(EF)之间的比例关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
8.60
自引率
0.00%
发文量
1
审稿时长
13 weeks
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