Proximal policy optimization with population-based variable neighborhood search algorithm for coordinating photo-etching and acid-etching processes in sustainable storage chip manufacturing

Abstract

In the complex process of manufacturing storage chips, the photo-etching and acid-etching stages play a crucial role, significantly affecting energy consumption and environmental impact. This paper introduces a novel Bi-Level Programming Model for Storage Chip Manufacturing (BLPM-SCM) aimed at optimizing the coordination between these two stages. The upper-level model focuses on minimizing the time it takes to complete wafer production, while the lower-level model seeks to reduce the number of acid-etching tanks used, thereby balancing production efficiency with resource utilization. To address the inherent complexity of the bi-level model, we present a hybrid meta-heuristic algorithm that combines Proximal Policy Optimization (PPO) with a Population-based Variable Neighborhood Search (PVNS) method. The PPO-PVNS algorithm enhances the intensification phase by adaptively selecting shaking and local search strategies, while PVNS supports the diversification phase, ensuring comprehensive exploration of the search space through iterative updates of the solution population. Extensive numerical experiments demonstrate the algorithm's superior performance and generalization capabilities in optimizing the manufacturing process. It significantly improves the coordination between the photo-etching and acid-etching stages, achieving dual optimization of energy consumption and environmental benefits. Furthermore, this study provides valuable insights and decision-making tools for industry practitioners, offering innovative solutions for scheduling optimization in the semiconductor sector and promoting more sustainable and efficient production practices.