Ferroelectric field effect transistors based on two-dimensional CuInP2S6 (CIPS) and graphene heterostructures.

IF 4.3
Maheera Abdul Ghani, Soumya Sarkar, Yang Li, Ye Wang, Kenji Watanabe, Takashi Taniguchi, Yan Wang, Manish Chhowalla
{"title":"Ferroelectric field effect transistors based on two-dimensional CuInP<sub>2</sub>S<sub>6</sub> (CIPS) and graphene heterostructures.","authors":"Maheera Abdul Ghani, Soumya Sarkar, Yang Li, Ye Wang, Kenji Watanabe, Takashi Taniguchi, Yan Wang, Manish Chhowalla","doi":"10.1557/s43581-024-00109-y","DOIUrl":null,"url":null,"abstract":"<p><strong>Abstract: </strong>Heterostructures of two-dimensional (2D) materials comprise clean van der Waals (vdW) interfaces that can facilitate charge or energy transfer. Recently, the 2D ferroelectric CuInP<sub>2</sub>S<sub>6</sub> (CIPS) has been integrated with graphene and other 2D materials to realize potentially novel low energy electronic devices. However, the influence of 2D CIPS on the properties of graphene and doping across the vdW interface has not been studied in detail. Here, we study graphene field effect transistors (FETs) with CIPS as the top gate. We find that CIPS leads to modulation of the graphene Fermi level due to local doping. We also find polarization-induced hysteresis in CIPS-gated graphene FETs. Electrical transport measurements from 50 to300 K show that above 200 K, the ferroelectric response decreases. As a result, the hysteresis voltage windows in the graphene ferroelectric FETs (FeFET) transfer curves decrease above 200 K. Our results show that interfacial remote doping affects the macroscopic polarization and performance of CIPS-based graphene FeFETs.</p><p><strong>Graphical abstract: </strong></p><p><strong>Highlights: </strong>This research studies the temperature-dependent local doping across a vdW ferroelectric/2D channel interface that affects the transport properties of ferroelectric field effect transistors (FeFETs).Experimental findings showed ferroelectric polarization switching-based hysteresis in CuInP<sub>2</sub>S<sub>6</sub>-gated graphene FeFETs.</p><p><strong>Discussion: </strong>vdW ferroelectrics that can be scaled to atomic layer thicknesses are useful for miniaturised low energy electronics.Understanding the interface charge or energy transfer in vdW ferroelectrics is essential for their integration into current or future technologies.</p><p><strong>Supplementary information: </strong>The online version contains supplementary material available at 10.1557/s43581-024-00109-y.</p>","PeriodicalId":74229,"journal":{"name":"MRS energy & sustainability : a review journal","volume":"11 2","pages":"616-623"},"PeriodicalIF":4.3000,"publicationDate":"2024-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC11564258/pdf/","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"MRS energy & sustainability : a review journal","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1557/s43581-024-00109-y","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2024/8/21 0:00:00","PubModel":"Epub","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Abstract: Heterostructures of two-dimensional (2D) materials comprise clean van der Waals (vdW) interfaces that can facilitate charge or energy transfer. Recently, the 2D ferroelectric CuInP2S6 (CIPS) has been integrated with graphene and other 2D materials to realize potentially novel low energy electronic devices. However, the influence of 2D CIPS on the properties of graphene and doping across the vdW interface has not been studied in detail. Here, we study graphene field effect transistors (FETs) with CIPS as the top gate. We find that CIPS leads to modulation of the graphene Fermi level due to local doping. We also find polarization-induced hysteresis in CIPS-gated graphene FETs. Electrical transport measurements from 50 to300 K show that above 200 K, the ferroelectric response decreases. As a result, the hysteresis voltage windows in the graphene ferroelectric FETs (FeFET) transfer curves decrease above 200 K. Our results show that interfacial remote doping affects the macroscopic polarization and performance of CIPS-based graphene FeFETs.

Graphical abstract:

Highlights: This research studies the temperature-dependent local doping across a vdW ferroelectric/2D channel interface that affects the transport properties of ferroelectric field effect transistors (FeFETs).Experimental findings showed ferroelectric polarization switching-based hysteresis in CuInP2S6-gated graphene FeFETs.

Discussion: vdW ferroelectrics that can be scaled to atomic layer thicknesses are useful for miniaturised low energy electronics.Understanding the interface charge or energy transfer in vdW ferroelectrics is essential for their integration into current or future technologies.

Supplementary information: The online version contains supplementary material available at 10.1557/s43581-024-00109-y.

基于二维 CuInP2S6 (CIPS) 和石墨烯异质结构的铁电场效应晶体管。
摘要:二维(2D)材料的异质结构包含可促进电荷或能量转移的清洁范德华(vdW)界面。最近,二维铁电体 CuInP2S6 (CIPS) 与石墨烯和其他二维材料相结合,实现了潜在的新型低能耗电子器件。然而,二维 CIPS 对石墨烯特性和 vdW 界面掺杂的影响尚未得到详细研究。在这里,我们研究了以 CIPS 作为顶栅的石墨烯场效应晶体管 (FET)。我们发现,由于局部掺杂,CIPS 会导致石墨烯费米级的调制。我们还在 CIPS 栅极石墨烯场效应晶体管中发现了极化诱导的滞后现象。从 50 到 300 K 的电输运测量表明,超过 200 K 时,铁电响应会减弱。因此,石墨烯铁电场效应晶体管(FeFET)传输曲线中的滞后电压窗口在 200 K 以上会减小。我们的研究结果表明,界面远程掺杂会影响基于 CIPS 的石墨烯铁电场效应晶体管的宏观极化和性能:实验结果表明,在 CuInP2S6 门控石墨烯 FeFET 中存在基于铁电极化切换的磁滞。讨论:可缩放至原子层厚度的 vdW 铁电对小型化低能耗电子器件非常有用。了解 vdW 铁电中的界面电荷或能量转移对于将其集成到当前或未来技术中至关重要:在线版本包含补充材料,可查阅 10.1557/s43581-024-00109-y。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信