SiCx:H and SiCxNy:H Amorphous Films Prepared from Hexamethyldisilane Vapors

IF 1.2 4区化学 Q4 CHEMISTRY, INORGANIC & NUCLEAR

Journal of Structural Chemistry Pub Date : 2024-11-11 DOI:10.1134/S0022476624100147

M. N. Chagin, E. N. Ermakova, V. R. Shayapov, V. S. Sulyaeva, I. V. Yushina, E. A. Maksimovskiy, S. P. Dudkina, A. A. Saraev, E. Y. Gerasimov, K. P. Mogilnikov, A. N. Kolodin, M. L. Kosinova

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Abstract

Amorphous transparent SiC_x:H and SiC_xN_y:H films are prepared at a temperature of 200 °C and a discharge power of 200 W in an inductively coupled RF plasma reactor using hexamethyldisilane vapors and additional argon and/or nitrogen gases. The influence of N₂ flow rate on the morphology, chemical structure, elemental composition, transmittance, refractive index, contact angle, and film deposition rate is studied. Plasma components are determined by optical emission spectroscopy. It is shown by HRTEM and EDS mapping methods that the annealed Cu/SiC_x:H/Si(100) sample has distinct substrate/film and film/copper layer interfaces, no Cu diffusion occurs, and that the SiC_x:H the film can be considered as a promising diffusion barrier layer. Stability of the films during storage under ambient conditions is studied. The tendency of SiC_xN_y:H films to oxidize is revealed by EDS, IR spectroscopy, and XPS.

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利用六甲基二硅烷蒸汽制备 SiCx:H 和 SiCxNy:H 无定形薄膜

在电感耦合射频等离子体反应器中，使用六甲基二硅烷蒸汽和额外的氩气和/或氮气，在 200 °C 的温度和 200 W 的放电功率下制备了非晶态透明 SiCx:H 和 SiCxNy:H 薄膜。研究了 N2 流速对薄膜形态、化学结构、元素组成、透射率、折射率、接触角和沉积速率的影响。等离子体成分是通过光学发射光谱测定的。HRTEM 和 EDS 图谱方法表明，退火的 Cu/SiCx:H/Si(100) 样品具有明显的基底/薄膜和薄膜/铜层界面，没有发生铜扩散，SiCx:H 薄膜可被视为一种有前途的扩散阻挡层。研究了薄膜在环境条件下储存期间的稳定性。EDS 、红外光谱和 XPS 揭示了 SiCxNy:H 薄膜的氧化倾向。

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来源期刊

Journal of Structural Chemistry 化学-无机化学与核化学

CiteScore

1.60

自引率

12.50%

发文量

142

审稿时长

8.3 months

期刊介绍： Journal is an interdisciplinary publication covering all aspects of structural chemistry, including the theory of molecular structure and chemical bond; the use of physical methods to study the electronic and spatial structure of chemical species; structural features of liquids, solutions, surfaces, supramolecular systems, nano- and solid materials; and the crystal structure of solids.