Atomic Layer Deposition Synthesis of thin Films of Vanadium Oxides in a Reducing Hydrogen Atmosphere

IF 1.2 4区 化学 Q4 CHEMISTRY, INORGANIC & NUCLEAR
B. V. Voloshin, V. A. Seleznev, V. A. Golyashov
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引用次数: 0

Abstract

The work considers the synthesis of thin films of vanadium oxides by plasma-enhanced atomic layer deposition (PE-ALD). A procedure is proposed to obtain thin films of amorphous vanadium dioxide. The hydrogen effect on the composition of deposited films during PE-ALD is analyzed. Hydrogen is shown to decrease the vanadium oxidation state in the deposited films and amorphize the structure. The mechanism of amorphization is discussed. The application of plasma enhancement promotes the hydrogen reducing activity. Calcination of films consisting of a mixture of vanadium oxides in hydrogen plasma enables the preparation of films of solely amorphous vanadium dioxide.

Abstract Image

在还原氢气氛中原子层沉积合成氧化钒薄膜
这项研究考虑了通过等离子体增强原子层沉积(PE-ALD)合成氧化钒薄膜的问题。提出了一种获得无定形二氧化钒薄膜的程序。分析了氢对 PE-ALD 过程中沉积薄膜成分的影响。结果表明,氢会降低沉积薄膜中钒的氧化态,并使其结构非晶化。讨论了非晶化的机理。等离子体的应用增强了氢还原活性。在氢等离子体中煅烧由钒氧化物混合物组成的薄膜,可以制备出纯无定形二氧化钒薄膜。
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来源期刊
Journal of Structural Chemistry
Journal of Structural Chemistry 化学-无机化学与核化学
CiteScore
1.60
自引率
12.50%
发文量
142
审稿时长
8.3 months
期刊介绍: Journal is an interdisciplinary publication covering all aspects of structural chemistry, including the theory of molecular structure and chemical bond; the use of physical methods to study the electronic and spatial structure of chemical species; structural features of liquids, solutions, surfaces, supramolecular systems, nano- and solid materials; and the crystal structure of solids.
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