Augmentation of Halide Vacancy Rectification through Copper Ion Polarization in Nonsubstituted Porphyrin for Printable Carbon-Based Perovskite Solar Cells

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Yuting Li, Jingwen He and Wenjun Wu*, 
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Abstract

In the context of porphyrins, enhancing their charge transfer or defect repair function in perovskite solar cells has been a primary focus of the current research, particularly through the introduction of functional groups. This enhancement of the porphyrin framework’s defect repair capability is a crucial strategy for simplifying device assembly processes and reducing costs. In our study, we introduced metal ions into the porphyrin ring via a straightforward one-step reaction, which induced polarization of the large π bond electron cloud within the ring, thereby augmenting its interaction with perovskite defect states. Our research discovered that the introduction of copper ions could significantly increase the dipole moment of the porphyrin ring from 0.0062 to 0.0737D, which is the fundamental reason for ion-induced passivation enhancement. The introduction of copper ions also strengthens the binding ability of the negative electron end with halogen vacancies (uncoordinated Pb2+) and inhibits the migration of I ions. As a result, the photovoltaic conversion efficiency of fully printable mesoscopic perovskite solar cells (p-MPSCs) increased from 14.15% in the control group to 16.13%. This work has thus opened a new pathway for enhancing the ability to repair perovskite defect states through the electron induction of the porphyrin ring.

Abstract Image

通过铜离子极化增强非取代卟啉中的卤化物空位整流,实现可印刷碳基过氧化物太阳能电池
就卟啉而言,增强其在过氧化物太阳能电池中的电荷转移或缺陷修复功能一直是当前研究的主要重点,特别是通过引入功能基团。增强卟啉框架的缺陷修复能力是简化设备组装工艺和降低成本的关键策略。在我们的研究中,我们通过简单的一步反应将金属离子引入卟啉环,从而诱导环内大π键电子云的极化,从而增强其与过氧化物缺陷态的相互作用。我们的研究发现,铜离子的引入可使卟啉环的偶极矩从 0.0062 显著增加到 0.0737D,这是离子诱导钝化增强的根本原因。铜离子的引入还增强了负电子端与卤素空位(非配位 Pb2+)的结合能力,抑制了 I- 离子的迁移。因此,完全可印刷介观过氧化物太阳能电池(p-MPSCs)的光电转换效率从对照组的 14.15%提高到了 16.13%。因此,这项工作为通过卟啉环的电子诱导增强修复包晶缺陷状态的能力开辟了一条新途径。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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