Effects of N, O, S on generalized stacking fault energies and dislocation movements in γ-Ni and γ′-Ni3Al

IF 3 3区 化学 Q3 CHEMISTRY, PHYSICAL
Xinyue Zhang, Xiaohua Min, Chao Lu
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引用次数: 0

Abstract

The effects of interstitial atoms (N, O and S) on generalized stacking fault energies in the γ-Ni and γ′-Ni3Al were systematically elucidated by first-principles calculations. N, O and S atoms had the preference for octahedral interstitial sites in γ phase. N and S atoms had the preference for octahedral interstitial site with 6Ni atoms in γ′ phase, while O atom had the preference for octahedral interstitial site with 2Al4Ni atoms. With the addition of adopted atoms, the intrinsic stacking fault energy in γ phase was decreased and the anti-phase boundary energy in γ′ phase was increased, which were attributed to the charge redistribution between the adopted atoms and neighbouring Ni atoms. The addition of N, S, especially O, hindered the extended dislocation movement and enhanced its formation probability. The addition of O and S atoms significantly enhanced the formation probability of Kear-Wilsdorf dislocation lock in γ′ phase, while the addition of N slightly reduced it.

Abstract Image

N、O、S 对γ-Ni 和 γ′-Ni3Al 中广义堆积断层能和位错运动的影响
第一原理计算系统地阐明了间隙原子(N、O 和 S)对γ-Ni 和 γ′-Ni3Al 中广义堆积断层能的影响。在γ相中,N、O和S原子偏爱八面体间隙位点。在γ′相中,N 原子和 S 原子偏好与 6Ni 原子的八面体间隙位点,而 O 原子偏好与 2Al4Ni 原子的八面体间隙位点。随着被接纳原子的加入,γ 相的本征堆积断层能降低,γ′ 相的反相边界能增加,这归因于被接纳原子与相邻镍原子之间的电荷再分配。N、S,尤其是 O 原子的加入阻碍了扩展位错的运动,提高了其形成概率。O 原子和 S 原子的加入大大提高了γ′相中 Kear-Wilsdorf 位错锁的形成概率,而 N 原子的加入则略微降低了这一概率。
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来源期刊
CiteScore
4.20
自引率
10.70%
发文量
331
审稿时长
31 days
期刊介绍: Computational and Theoretical Chemistry publishes high quality, original reports of significance in computational and theoretical chemistry including those that deal with problems of structure, properties, energetics, weak interactions, reaction mechanisms, catalysis, and reaction rates involving atoms, molecules, clusters, surfaces, and bulk matter.
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