Effect of Thermal Annealing on Properties Ga2O3/GaAs:Cr Heterostructures

IF 1.1 4区 物理与天体物理 Q4 PHYSICS, APPLIED
V. M. Kalygina, O. S. Kiseleva, V. V. Kopyev, B. O. Kushnarev, V. L. Oleinik, Y. S. Petrova, A. V. Tsymbalov
{"title":"Effect of Thermal Annealing on Properties Ga2O3/GaAs:Cr Heterostructures","authors":"V. M. Kalygina,&nbsp;O. S. Kiseleva,&nbsp;V. V. Kopyev,&nbsp;B. O. Kushnarev,&nbsp;V. L. Oleinik,&nbsp;Y. S. Petrova,&nbsp;A. V. Tsymbalov","doi":"10.1134/S106378422406015X","DOIUrl":null,"url":null,"abstract":"<p>Data on the sensitivity of Ga<sub>2</sub>O<sub>3</sub>/GaAs:Cr heterostructures are presented to long-wave and UV (λ = 254 nm) radiation. The samples were obtained by RF magnetron sputtering of a gallium oxide film on non-heated GaAs:Cr substrates. Gallium arsenide plates with a Ga<sub>2</sub>O<sub>3</sub> film were divided into two parts: one half was not annealed, and the other was annealed in argon at 500°C for 30 min. Regardless of the presence or absence of heat treatment, the studied structures exhibit a photovoltaic effect and are able to operate in an autonomous mode. It is shown that a noticeable sensitivity to long-wave radiation appears in the samples only after thermal annealing of gallium oxide films. The response and recovery times of such UV radiation detectors do not exceed 1 second.</p>","PeriodicalId":783,"journal":{"name":"Technical Physics","volume":"69 6","pages":"1584 - 1589"},"PeriodicalIF":1.1000,"publicationDate":"2024-09-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Technical Physics","FirstCategoryId":"101","ListUrlMain":"https://link.springer.com/article/10.1134/S106378422406015X","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
引用次数: 0

Abstract

Data on the sensitivity of Ga2O3/GaAs:Cr heterostructures are presented to long-wave and UV (λ = 254 nm) radiation. The samples were obtained by RF magnetron sputtering of a gallium oxide film on non-heated GaAs:Cr substrates. Gallium arsenide plates with a Ga2O3 film were divided into two parts: one half was not annealed, and the other was annealed in argon at 500°C for 30 min. Regardless of the presence or absence of heat treatment, the studied structures exhibit a photovoltaic effect and are able to operate in an autonomous mode. It is shown that a noticeable sensitivity to long-wave radiation appears in the samples only after thermal annealing of gallium oxide films. The response and recovery times of such UV radiation detectors do not exceed 1 second.

Abstract Image

热退火对 Ga2O3/GaAs:Cr 异质结构特性的影响
本文介绍了 Ga2O3/GaAs:Cr 异质结构对长波和紫外线(λ = 254 纳米)辐射的敏感性数据。样品是通过射频磁控溅射在未加热的砷化镓:铬基底上形成氧化镓薄膜而获得的。带有 Ga2O3 薄膜的砷化镓板被分为两部分:一半未退火,另一半在 500°C 的氩气中退火 30 分钟。无论是否经过热处理,所研究的结构都显示出光伏效应,并能以自主模式运行。研究表明,只有在对氧化镓薄膜进行热退火处理后,样品才会对长波辐射产生明显的敏感性。这种紫外线辐射探测器的响应和恢复时间不超过 1 秒。
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来源期刊
Technical Physics
Technical Physics 物理-物理:应用
CiteScore
1.30
自引率
14.30%
发文量
139
审稿时长
3-6 weeks
期刊介绍: Technical Physics is a journal that contains practical information on all aspects of applied physics, especially instrumentation and measurement techniques. Particular emphasis is put on plasma physics and related fields such as studies of charged particles in electromagnetic fields, synchrotron radiation, electron and ion beams, gas lasers and discharges. Other journal topics are the properties of condensed matter, including semiconductors, superconductors, gases, liquids, and different materials.
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