Non-thermal inactivation effects of metal oxide nanoparticles–graphene composite films on foodborne pathogens to reduce proliferation

IF 6.1 1区 工程技术 Q1 ENGINEERING, MANUFACTURING
Jun Uk Lee , Jeong Myung Yung , Kwangseuk Kyhm , Bo-Sung Shin , Patrick C. Lee
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Abstract

Emergence of antibiotic-resistant foodborne pathogens poses a significant threat to global public health. There is an urgent demand for next-generation antibacterial materials to effectively control the proliferation of pathogenic bacteria. This study fabricated graphene films with bactericidal properties via an approach that entailed the laser synthesis of high dense and uniform metal oxide nanoparticles, viz., titanium dioxide (TiO2), copper (II) oxide (CuO), and iron (II) oxide (Fe3O4) nanoparticles, directly onto ultraviolet laser-induced graphene (UV-LIG) surfaces. Bacterial treatment on UV-LIG decorated with dense and uniform TiO2 nanospheres significantly reduced the counts of Bacillus cereus, Salmonella enterica serovar Typhimurium, Escherichia coli O157:H7, and Staphylococcus aureus to below the detection limit (log CFU/mL), achieving above 99.999 kill rate. TiO2/UV-LIG films limited cell proliferation rates of pathogens B. cereus to 1.3 % and S. Typhimurium to 2.1 % after 24-h. These results demonstrate that utilizing highly dense and uniform TiO2 nanospheres on UV-LIG composite films is a promising strategy for combating foodborne pathogens.
金属氧化物纳米粒子-石墨烯复合膜对食源性病原体的非热灭活效应,以减少其增殖
抗生素耐药性食源性病原体的出现对全球公共卫生构成了重大威胁。目前迫切需要新一代抗菌材料来有效控制病原菌的繁殖。本研究通过激光在紫外激光诱导石墨烯(UV-LIG)表面直接合成高密度和均匀的金属氧化物纳米颗粒(即二氧化钛(TiO2)、氧化铜(CuO)和氧化铁(Fe3O4)纳米颗粒)的方法,制备了具有杀菌性能的石墨烯薄膜。在装饰有致密均匀 TiO2 纳米球的 UV-LIG 上进行细菌处理,可显著降低蜡样芽孢杆菌、伤寒沙门氏菌、大肠杆菌 O157:H7 和金黄色葡萄球菌的数量,使其低于检测限(log CFU/mL),杀灭率超过 99.999。24 小时后,TiO2/UV-LIG 薄膜将病原体蜡样芽孢杆菌的细胞增殖率限制在 1.3%,将伤寒杆菌的细胞增殖率限制在 2.1%。这些结果表明,在 UV-LIG 复合薄膜上使用高密度和均匀的 TiO2 纳米球是一种很有前景的抗食源性病原体的策略。
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来源期刊
Journal of Manufacturing Processes
Journal of Manufacturing Processes ENGINEERING, MANUFACTURING-
CiteScore
10.20
自引率
11.30%
发文量
833
审稿时长
50 days
期刊介绍: The aim of the Journal of Manufacturing Processes (JMP) is to exchange current and future directions of manufacturing processes research, development and implementation, and to publish archival scholarly literature with a view to advancing state-of-the-art manufacturing processes and encouraging innovation for developing new and efficient processes. The journal will also publish from other research communities for rapid communication of innovative new concepts. Special-topic issues on emerging technologies and invited papers will also be published.
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