{"title":"The role of interface trap charges in MoS2 thickness engineered TFET","authors":"","doi":"10.1016/j.commatsci.2024.113386","DOIUrl":null,"url":null,"abstract":"<div><div>The 2D molybdenum disulfide (MoS<sub>2</sub>) based short-channel FET has shown remarkable performance, and there is an increasing demand for research on the factors that affect the device characteristics. Although interface trap charges (ITCs) have been observed during various experimental studies on MoS<sub>2</sub>-oxide interfaces, it is still unclear how this is affecting device-level performance. To fill this gap, the present work focuses on the impact of ITCs in MoS<sub>2</sub> Thickness Engineered TFETs (MoS<sub>2</sub> TE-TFET) by considering both positive (donor) and negative (acceptor) types of ITCs at the MoS<sub>2</sub>-HfO<sub>2</sub> interface. The different ITC density ranges, such as N<sub>f</sub> = −4 × 10<sup>12</sup>cm<sup>−2</sup> to +4 × 10<sup>12</sup> cm<sup>−2</sup> and N<sub>f</sub> = −4 × 10<sup>11</sup>cm<sup>−2</sup> to +4 × 10<sup>11</sup>cm<sup>−2</sup> are considered to explore I<sub>ON</sub>, V<sub>th</sub>, I<sub>OFF</sub>, I<sub>ON</sub>/I<sub>OFF</sub>, transfer characteristics, energy band diagram, electric field, potential and maximum electron mobility device parameters. Additionally, a comparison of the I<sub>ON</sub>/I<sub>OFF</sub> ratio, V<sub>th</sub>, and electron mobility with existing literature is presented.</div></div>","PeriodicalId":10650,"journal":{"name":"Computational Materials Science","volume":null,"pages":null},"PeriodicalIF":3.1000,"publicationDate":"2024-09-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Computational Materials Science","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0927025624006074","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
The 2D molybdenum disulfide (MoS2) based short-channel FET has shown remarkable performance, and there is an increasing demand for research on the factors that affect the device characteristics. Although interface trap charges (ITCs) have been observed during various experimental studies on MoS2-oxide interfaces, it is still unclear how this is affecting device-level performance. To fill this gap, the present work focuses on the impact of ITCs in MoS2 Thickness Engineered TFETs (MoS2 TE-TFET) by considering both positive (donor) and negative (acceptor) types of ITCs at the MoS2-HfO2 interface. The different ITC density ranges, such as Nf = −4 × 1012cm−2 to +4 × 1012 cm−2 and Nf = −4 × 1011cm−2 to +4 × 1011cm−2 are considered to explore ION, Vth, IOFF, ION/IOFF, transfer characteristics, energy band diagram, electric field, potential and maximum electron mobility device parameters. Additionally, a comparison of the ION/IOFF ratio, Vth, and electron mobility with existing literature is presented.
期刊介绍:
The goal of Computational Materials Science is to report on results that provide new or unique insights into, or significantly expand our understanding of, the properties of materials or phenomena associated with their design, synthesis, processing, characterization, and utilization. To be relevant to the journal, the results should be applied or applicable to specific material systems that are discussed within the submission.