A new method for estimating nanoparticle deposition coverage from a set of weak-contrast SEM images

IF 2.1 3区 工程技术 Q2 MICROSCOPY
Bchara Sidnawi , Liang Zhao , Bo Li , Qianhong Wu
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引用次数: 0

Abstract

Imaging nanomaterials in hybrid systems is critical to understanding the structure and functionality of these systems. However, current technologies such as scanning electron microscopy (SEM) may obtain high resolution/contrast images at the cost of damaging or contaminating the sample. For example, to prevent the charging of organic substrate/matrix, a very thin layer of metal is coated on the surface, which will permanently contaminate the sample and eliminate the possibility of reusing it for following processes. Conversely, examining the sample without any modifications, in pursuit of high-fidelity digital images of its unperturbed state, can come at the cost of low-quality images that are challenging to process. Here, a solution is proposed for the case where no brightness threshold is available to reliably judge whether a region is covered with nanomaterials. The method examines local brightness variability to detect nanomaterial deposits. Very good agreement with manually obtained values of the coverage is observed, and a strong case is made for the method's automatability. Although the developed methodology is showcased in the context of SEM images of Polydimethylsiloxane (PDMS) substrates on which silicone dioxide (SiO2) nanoparticles are assembled, the underlying concepts may be extended to situations where straightforward brightness thresholding is not viable.

从一组弱对比 SEM 图像中估算纳米粒子沉积覆盖率的新方法
对混合系统中的纳米材料进行成像对于了解这些系统的结构和功能至关重要。然而,扫描电子显微镜(SEM)等现有技术在获得高分辨率/高对比度图像的同时,也会对样品造成损害或污染。例如,为了防止有机基底/基质带电,需要在其表面涂上一层很薄的金属,这将永久性地污染样品,使其无法再用于后续工艺。相反,为了获得未受干扰状态下的高保真数字图像,在不做任何改动的情况下对样品进行检测,可能会导致图像质量低下,难以处理。在此,针对没有亮度阈值来可靠判断某个区域是否被纳米材料覆盖的情况,提出了一种解决方案。该方法利用局部亮度变化来检测纳米材料沉积。结果表明,该方法与人工获得的覆盖值非常吻合,并有力地证明了该方法的自动化程度。虽然所开发的方法是在聚二甲基硅氧烷(PDMS)基底的扫描电镜图像中展示的,而二氧化硅(SiO2)纳米粒子是在该基底上组装的,但其基本概念可扩展到无法直接使用亮度阈值的情况。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Ultramicroscopy
Ultramicroscopy 工程技术-显微镜技术
CiteScore
4.60
自引率
13.60%
发文量
117
审稿时长
5.3 months
期刊介绍: Ultramicroscopy is an established journal that provides a forum for the publication of original research papers, invited reviews and rapid communications. The scope of Ultramicroscopy is to describe advances in instrumentation, methods and theory related to all modes of microscopical imaging, diffraction and spectroscopy in the life and physical sciences.
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