Design and investigation of gaussian doped junction free SMDG and TMDG-TFET for analog/RF applications

IF 1.5 Q2 ENGINEERING, MULTIDISCIPLINARY
Tamilarasi R and Karthik S
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引用次数: 0

Abstract

This research investigates four variants of Gaussian Doped (GD) Double Gate Single Material and Tri-Material Junction-Free Tunnel-Field-Effect-Transistors (GD-DG-JF-TFETs) to optimize their performance in analog and RF applications. The analysis is conducted using the Sentaurus Synopsis TCAD simulation tool, reveals a Subthreshold Swing (SS) as low as 38 mV/dec, exceptionally higher cut-off-frequency (ft) and maximum-oscillation-frequency ( ) of 516 GHz and 895 GHz, respectively. The proposed TMDG-JF-TFET enhances band-to-band tunneling between the drain and source regions, resulting in an extremely low-off-state-current (Ioff) of 9.6 fA and large-on-state current (ION) of 6.7 mA in Permittivity of high-k (HfO2 = 25) and low-k (SiO2 = 3.8) based structures.Compared to conventional SMDG technologies, the TMDG structures exhibits 36% reduction in SS, a 16% improvement in ft, an 18% enhancement in and 17% increase in ION. These improvements demonstrate that TMDG-based TFETs are superior devices for ultra-low-power-integrated-circuit-applications.
设计和研究用于模拟/射频应用的无高斯掺杂结 SMDG 和 TMDG-TFET
这项研究调查了四种掺杂高斯(GD)双栅单材料和三材料无结隧道场效应晶体管(GD-DG-JF-TFET)的变体,以优化其在模拟和射频应用中的性能。利用 Sentaurus Synopsis TCAD 仿真工具进行的分析表明,该器件的阈下波动(SS)低至 38 mV/dec,截止频率(ft)和最大振荡频率( )分别高达 516 GHz 和 895 GHz。所提出的 TMDG-JF-TFET 增强了漏极和源极区域之间的带间隧道效应,从而在高导通率环境中实现了 9.6 fA 的超低截止态电流(Ioff)和 6.7 mA 的超大导通态电流(ION)。与传统的 SMDG 技术相比,TMDG 结构的 SS 降低了 36%,ft 提高了 16%,ION 增强了 18%,ION 增加了 17%。这些改进表明,基于 TMDG 的 TFET 是用于超低功耗集成电路应用的卓越器件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Engineering Research Express
Engineering Research Express Engineering-Engineering (all)
CiteScore
2.20
自引率
5.90%
发文量
192
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