Silica infiltration as a strategy to overcome zirconia degradation

IF 3.4 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Najm M. Alfrisany, Eszter Somogyi-Ganss, Laura E Tam, Benjamin D. Hatton, Rana N. S. Sodhi, Ling Yin, Grace M. De Souza
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引用次数: 0

Abstract

The excellent clinical performance of yttria-partially stabilized zirconias (Y-SZs) makes them promising materials for indirect restorations. However, the Y-SZ phase stability is a concern, and infiltrating Y-SZs with a silica nanofilm may delay their degradation processes. In this study, we analyzed stabilities of silica-infiltrated zirconia surfaces after exposure to artificial aging (AA).

Four zirconia materials with different translucencies (n = 40) were used, including low translucency 3 mol% Y-SZ (3Y-LT, Ceramill ZI, Amann Girrbach); high translucency 4 mol% Y-SZ (4Y-HT, Ceramill Zolid); and two high translucency 5 mol% Y-SZs (5Y-HT, Lava Esthetic, 3M and 5Y-SHT, Ceramill Zolid, FX white). Sintered specimens were exposed to 40 cycles of silica (SiO2) through room temperature atomic layer deposition (RT-ALD) using tetramethoxysilane (TMOS) and ammonium hydroxide (NH4OH). AA was applied for 15 h in an autoclave (134°C, 2 bar pressure). Stabilities of zirconia-silica surfaces were characterized in terms of hardness and Young's modulus using nanoindentation techniques and crystalline contents using x-ray diffraction (XRD) analyses. Silica deposition was also characterized by X-ray photoelectron spectroscopy (XPS).

There was a significant effect of the interaction of materials and surface treatments on the hardness and Young's modulus values of zirconia-silica surfaces (p < 0.001). Silica deposition on zirconia surfaces improved the material resistance to degradation by AA.

将二氧化硅渗入作为克服氧化锆降解的一种策略
钇部分稳定锆石(Y-SZ)具有出色的临床表现,是一种很有前途的间接修复材料。然而,Y-SZ 相的稳定性是一个令人担忧的问题,用二氧化硅纳米薄膜渗入 Y-SZ 可能会延缓其降解过程。在这项研究中,我们分析了二氧化硅浸润氧化锆表面暴露于人工老化(AA)后的稳定性。我们使用了四种不同透光度的氧化锆材料(n = 40),包括低透光度 3 mol% Y-SZ(3Y-LT,Ceramill ZI,Amann Girrbach);高透光度 4 mol% Y-SZ(4Y-HT,Ceramill Zolid);以及两种高透光度 5 mol% Y-SZ(5Y-HT,Lava Esthetic,3M 和 5Y-SHT,Ceramill Zolid,FX white)。通过使用四甲氧基硅烷 (TMOS) 和氢氧化铵 (NH4OH) 进行室温原子层沉积 (RT-ALD),烧结试样暴露于二氧化硅 (SiO2) 40 个周期。AA 在高压釜(134°C,2 巴压力)中应用 15 小时。氧化锆-二氧化硅表面的稳定性通过纳米压痕技术的硬度和杨氏模量以及 X 射线衍射 (XRD) 分析的结晶含量来表征。材料和表面处理的相互作用对氧化锆-二氧化硅表面的硬度和杨氏模量值有显著影响(p < 0.001)。氧化锆表面的二氧化硅沉积提高了材料抗 AA 降解的能力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
8.60
自引率
0.00%
发文量
1
审稿时长
13 weeks
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