Model of Physical Sputtering of Amorphous Materials
IF 1.1
4区 物理与天体物理
Q4 PHYSICS, APPLIED
引用次数: 0
Abstract
The paper demonstrates the pulse mechanism of physical sputtering taking into account the evolution of the surface. The model is based on pulsed energy transfer in collision cascades. The main feature is the consideration of surface roughness. The results of numerical simulation qualitatively coincide with those observed in experiments. It is shown that the angular dependences calculated in the framework of this model have closer values of the sputtering yields to the experimental ones than those calculated in TRIM.
非晶材料物理溅射模型
摘要 本文展示了考虑到表面演变的物理溅射脉冲机制。该模型基于碰撞级联中的脉冲能量转移。其主要特点是考虑了表面粗糙度。数值模拟的结果与实验观察到的结果基本吻合。结果表明，与 TRIM 计算的结果相比，在该模型框架内计算出的溅射产率的角度相关性值更接近实验值。
本文章由计算机程序翻译，如有差异，请以英文原文为准。
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来源期刊
Technical Physics
物理-物理：应用
CiteScore
1.30
自引率
14.30%
发文量
139
审稿时长
3-6 weeks
期刊介绍：
Technical Physics is a journal that contains practical information on all aspects of applied physics, especially instrumentation and measurement techniques. Particular emphasis is put on plasma physics and related fields such as studies of charged particles in electromagnetic fields, synchrotron radiation, electron and ion beams, gas lasers and discharges. Other journal topics are the properties of condensed matter, including semiconductors, superconductors, gases, liquids, and different materials.
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