Magnetic Domain and Structural Defects Size in Ultrathin Films

IF 2.5 4区物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY

Physica Status Solidi-Rapid Research Letters Pub Date : 2024-09-10 DOI:10.1002/pssr.202400215

Assiongbon Adanlété Adjanoh, Tchilabalo Pakam, Serge Dzo Mawuefa Afenyiveh

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Abstract

Herein, a model is proposed for measuring the structural defects size r0 in an ultrathin magnetic layer with perpendicular magnetic anisotropy. Based on the observations of magnetic domains in Ta/Pt/Co/Pt ultrathin films, using polar magneto‐optical Kerr effect microscopy and measurements of their magnetic anisotropies, the correlation between magnetic domains size D and structural defects size r0, as well as the defects concentration parameter αK, which designates the degree of pinning, has been modeled. The average r0 value found is high in the sample with unannealed buffer layers and considerably decreases with annealing. It is 6.17 nm with unannealed Ta/Pt buffer layers, 1.06 nm in sample with Ta/Pt buffer layers annealed at 423 K, and 0.49 nm in that with buffer layers annealed at 573 K. The significant drop of r0 is in good agreement with the high depinning noted with buffer layers annealing in recent work.

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超薄薄膜中的磁畴和结构缺陷尺寸

本文提出了一个测量具有垂直磁各向异性的超薄磁层中结构缺陷尺寸 r0 的模型。利用极磁光克尔效应显微镜观察 Ta/Pt/Co/Pt 超薄薄膜中的磁畴，并测量其磁各向异性，在此基础上建立了磁畴尺寸 D 和结构缺陷尺寸 r0 之间的相关性模型，以及表示钉化程度的缺陷浓度参数 αK。在未退火缓冲层的样品中发现的平均 r0 值较高，并随着退火而大幅降低。未退火的钽/铂缓冲层的 r0 值为 6.17 nm，在 423 K 退火的钽/铂缓冲层样品中为 1.06 nm，在 573 K 退火的缓冲层样品中为 0.49 nm。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Physica Status Solidi-Rapid Research Letters 物理-材料科学：综合

CiteScore

5.20

自引率

3.60%

发文量

208

审稿时长

1.4 months

期刊介绍： Physica status solidi (RRL) - Rapid Research Letters was designed to offer extremely fast publication times and is currently one of the fastest double peer-reviewed publication media in solid state and materials physics. Average times are 11 days from submission to first editorial decision, and 12 days from acceptance to online publication. It communicates important findings with a high degree of novelty and need for express publication, as well as other results of immediate interest to the solid-state physics and materials science community. Published Letters require approval by at least two independent reviewers. The journal covers topics such as preparation, structure and simulation of advanced materials, theoretical and experimental investigations of the atomistic and electronic structure, optical, magnetic, superconducting, ferroelectric and other properties of solids, nanostructures and low-dimensional systems as well as device applications. Rapid Research Letters particularly invites papers from interdisciplinary and emerging new areas of research.