PatternPaint: Generating Layout Patterns Using Generative AI and Inpainting Techniques

Abstract

Generation of VLSI layout patterns is essential for a wide range of Design For Manufacturability (DFM) studies. In this study, we investigate the potential of generative machine learning models for creating design rule legal metal layout patterns. Our results demonstrate that the proposed model can generate legal patterns in complex design rule settings and achieves a high diversity score. The designed system, with its flexible settings, supports both pattern generation with localized changes, and design rule violation correction. Our methodology is validated on Intel 18A Process Design Kit (PDK) and can produce a wide range of DRC-compliant pattern libraries with only 20 starter patterns.