Preparation of Nanoabrasive for Magnetorheological Polishing of KDP Crystals

IF 1.4 4区 化学 Q4 CHEMISTRY, PHYSICAL
D. V. Belov, S. N. Belyaev, O. A. Malshakova, N. A. Sorokoletova, E. I. Serebrov
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Abstract

Magnetorheological polishing technology is widely used in the processing of high-precision optical elements. One of the determining factors in the magnetorheological polishing technology is the nature and quality of a nanoabrasive present in a magnetorheological suspension. In this study, a method has been developed for the sol–gel synthesis of amorphous silica nanospheres used as a nanoabrasive for magnetorheological polishing of water-soluble crystals used to manufacture nonlinear optical elements for laser technology. The practical success has been achieved by incorporating the synthesized silica nanoabrasive into a magnetorheological suspension. The physicochemical characteristics of the resulting nanoabrasive have been presented. Electron microscopy data have confirmed the spherical morphology of SiO2 particles, and it has been found that the particle size distribution varies in a range of 40–60 nm, thus ensuring the uniformity and high quality of treating the surfaces of optical elements with the magnetorheological suspension. The structure-related properties of the SiO2 nanoabrasive have been studied by X-ray powder diffraction. The incorporation of the SiO2 nanoabrasive into the magnetorheological suspension has made it possible to achieve the high-quality processing and cleanliness of the surface, as well as to ensure the finishing polishing of the surface of KDP single crystals to roughness values of no more than 6 Å. The results of the work are of interest for optimizing the process and improving the technology of magnetorheological polishing.

Abstract Image

制备用于 KDP 晶体磁流变抛光的纳米研磨剂
摘要 磁流变抛光技术广泛应用于高精度光学元件的加工。磁流变抛光技术的决定因素之一是磁流变悬浮液中纳米研磨剂的性质和质量。本研究开发了一种溶胶-凝胶合成无定形二氧化硅纳米球的方法,这种纳米球可用作纳米研磨剂,对用于制造激光技术非线性光学元件的水溶性晶体进行磁流变抛光。通过将合成的二氧化硅纳米研磨剂加入磁流变悬浮液中,取得了实际成功。研究人员介绍了纳米研磨剂的物理化学特性。电子显微镜数据证实了二氧化硅颗粒的球形形态,并发现粒度分布在 40-60 纳米范围内,从而确保了磁流变悬浮液处理光学元件表面的均匀性和高质量。通过 X 射线粉末衍射研究了二氧化硅纳米研磨剂的结构相关特性。在磁流变悬浮液中加入二氧化硅纳米研磨剂,可以实现高质量的表面处理和清洁,并确保对 KDP 单晶表面进行精抛光,使其粗糙度值不超过 6 Å。
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来源期刊
Colloid Journal
Colloid Journal 化学-物理化学
CiteScore
2.20
自引率
18.20%
发文量
36
审稿时长
6-12 weeks
期刊介绍: Colloid Journal (Kolloidnyi Zhurnal) is the only journal in Russia that publishes the results of research in the area of chemical science dealing with the disperse state of matter and surface phenomena in disperse systems. The journal covers experimental and theoretical works on a great variety of colloid and surface phenomena: the structure and properties of interfaces; adsorption phenomena and structure of adsorption layers of surfactants; capillary phenomena; wetting films; wetting and spreading; and detergency. The formation of colloid systems, their molecular-kinetic and optical properties, surface forces, interaction of colloidal particles, stabilization, and criteria of stability loss of different disperse systems (lyosols and aerosols, suspensions, emulsions, foams, and micellar systems) are also topics of the journal. Colloid Journal also includes the phenomena of electro- and diffusiophoresis, electro- and thermoosmosis, and capillary and reverse osmosis, i.e., phenomena dealing with the existence of diffusion layers of molecules and ions in the vicinity of the interface.
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