From weak to strong-coupling superconductivity tuned by substrate in TiN films

Yixin Liu, Yuchuan Liu, Zulei Xu, Aobo Yu, Xiaoni Wang, Wei Peng, Yu Wu, Gang Mu and Zhi-Rong Lin
{"title":"From weak to strong-coupling superconductivity tuned by substrate in TiN films","authors":"Yixin Liu, Yuchuan Liu, Zulei Xu, Aobo Yu, Xiaoni Wang, Wei Peng, Yu Wu, Gang Mu and Zhi-Rong Lin","doi":"10.1088/1361-6668/ad7642","DOIUrl":null,"url":null,"abstract":"The interplay between substrates and superconducting thin films has attracted increasing attention. Here, we report an in-depth investigation on superconducting properties of the epitaxial TiN thin films grown on three different substrates by dc reactive magnetron sputtering. The TiN films grown on (0001) sapphire exhibit (111) crystal orientation, while that grown on (100) Si and MgO substrates exhibit (100) orientation. Moreover, the samples grown on Si reveal a relatively lower level of disorder, accompanied by the higher critical transition temperature Tc and smaller magnitude of upper critical field slope near Tc. Remarkably, we uncovered a rather high value of superconducting gap (with = 3.05) in TiN film on Si indicating a very strong coupling superconductivity, in sharp contrast to the case using sapphires and MgO as the substrate which reveals a weak-coupling feature. The comprehensive analysis considering the scenarios of the three substrate shows that the grain size of the thin films may be an important factor influencing the superconductivity.","PeriodicalId":21985,"journal":{"name":"Superconductor Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2024-09-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Superconductor Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/1361-6668/ad7642","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

The interplay between substrates and superconducting thin films has attracted increasing attention. Here, we report an in-depth investigation on superconducting properties of the epitaxial TiN thin films grown on three different substrates by dc reactive magnetron sputtering. The TiN films grown on (0001) sapphire exhibit (111) crystal orientation, while that grown on (100) Si and MgO substrates exhibit (100) orientation. Moreover, the samples grown on Si reveal a relatively lower level of disorder, accompanied by the higher critical transition temperature Tc and smaller magnitude of upper critical field slope near Tc. Remarkably, we uncovered a rather high value of superconducting gap (with = 3.05) in TiN film on Si indicating a very strong coupling superconductivity, in sharp contrast to the case using sapphires and MgO as the substrate which reveals a weak-coupling feature. The comprehensive analysis considering the scenarios of the three substrate shows that the grain size of the thin films may be an important factor influencing the superconductivity.
从 TiN 薄膜中的弱耦合超导到基底调谐的强耦合超导
衬底与超导薄膜之间的相互作用已引起越来越多的关注。在此,我们报告了通过直流反应磁控溅射技术在三种不同衬底上生长的外延 TiN 薄膜超导特性的深入研究。生长在(0001)蓝宝石上的 TiN 薄膜呈现出(111)晶体取向,而生长在(100)硅和氧化镁基底上的 TiN 薄膜呈现出(100)取向。此外,在硅上生长的样品显示出相对较低的无序水平,同时临界转变温度 Tc 较高,Tc 附近的上临界场斜率较小。值得注意的是,我们在硅基 TiN 薄膜中发现了相当高的超导间隙值(with = 3.05),这表明其具有非常强的耦合超导性,这与使用蓝宝石和氧化镁作为衬底的情况形成鲜明对比,后者显示出弱耦合特征。对三种衬底情况的综合分析表明,薄膜的晶粒尺寸可能是影响超导性的一个重要因素。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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