Anomalous photo-thermoelectric effects of platinum and tungsten trioxide bilayers

IF 2.7 3区 物理与天体物理 Q2 PHYSICS, APPLIED
Takeru Ito, Chihiro Hanioka, Hiroshi Irie
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Abstract

We attempted to deposit a platinum (Pt) layer onto a tungsten trioxide (WO3) thin film (Pt/WO3). The Pt layer deposited on WO3 was oxidized by calcining Pt/WO3 in air to form PtOx/WO3. An n-type anomalous photo-thermoelectric (photo-TE) effect was confirmed for Pt/WO3 and Pt/HyWO3−x. HyWO3−x is a protonated WO3 after the gaschromic (GC) reaction of WO3 in Pt/WO3. The anomalous photo-TE effect was that both the electrical conductivity (σphoto) and the absolute value of the Seebeck coefficient (Sphoto) increased under UV light or visible light irradiation. After stopping the irradiation, σphoto and Sphoto decreased. In contrast, an n-type normal photo-TE effect was observed for PtOx/HyWO3−x after the GC reaction of PtOx/WO3, in which σphoto increased and the absolute value of Sphoto decreased under ultraviolet (UV) light irradiation, and vice versa after stopping the irradiation. These findings indicate that Pt was responsible for the anomalous photo-TE effect due to the electron accumulation capability of Pt, to which electrons were transferred from the conduction band of HyWO3−x. In contrast, electrons could not energetically transfer from HyWO3−x to PtO2, which existed in PtOx particles at the surface. Therefore, PtOx/HyWO3−x behaved similar to sole HyWO3−x, indicating the normal photo-TE effect.
铂和三氧化钨双层膜的反常光热电效应
我们尝试在三氧化钨(WO3)薄膜(Pt/WO3)上沉积铂(Pt)层。通过在空气中煅烧 Pt/WO3,在 WO3 上沉积的铂层被氧化,形成 PtOx/WO3。Pt/WO3 和 Pt/HyWO3-x 的 n 型反常光热电(photo-TE)效应得到了证实。HyWO3-x 是 WO3 在 Pt/WO3 中发生气致变色(GC)反应后的质子化 WO3。在紫外光或可见光照射下,电导率(σphoto)和塞贝克系数(Sphoto)的绝对值都会增加,这就是反常的光电效应。停止照射后,σphoto 和 Sphoto 会下降。相比之下,PtOx/WO3 的 GC 反应后,PtOx/HyWO3-x 出现了 n 型正常光-TE 效应,在紫外线(UV)照射下,σphoto 增加,Sphoto 的绝对值降低,停止照射后则相反。这些发现表明,由于铂的电子积累能力,电子从 HyWO3-x 的导带转移到铂上,从而产生了反常的光-TE 效应。相反,电子不能从 HyWO3-x 向 PtO2 发生能量转移,而 PtO2 存在于表面的 PtOx 粒子中。因此,PtOx/HyWO3-x 的表现与单独的 HyWO3-x 相似,表明存在正常的光-TE 效应。
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来源期刊
Journal of Applied Physics
Journal of Applied Physics 物理-物理:应用
CiteScore
5.40
自引率
9.40%
发文量
1534
审稿时长
2.3 months
期刊介绍: The Journal of Applied Physics (JAP) is an influential international journal publishing significant new experimental and theoretical results of applied physics research. Topics covered in JAP are diverse and reflect the most current applied physics research, including: Dielectrics, ferroelectrics, and multiferroics- Electrical discharges, plasmas, and plasma-surface interactions- Emerging, interdisciplinary, and other fields of applied physics- Magnetism, spintronics, and superconductivity- Organic-Inorganic systems, including organic electronics- Photonics, plasmonics, photovoltaics, lasers, optical materials, and phenomena- Physics of devices and sensors- Physics of materials, including electrical, thermal, mechanical and other properties- Physics of matter under extreme conditions- Physics of nanoscale and low-dimensional systems, including atomic and quantum phenomena- Physics of semiconductors- Soft matter, fluids, and biophysics- Thin films, interfaces, and surfaces
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