Quantifying physical degradation alongside recording and stimulation performance of 980 intracortical microelectrodes chronically implanted in three humans for 956-2246 days

D. A. Bjånes, S. Kellis, R. Nickl, B. Baker, T. Aflalo, L. Bashford, S. Chivukula, M. S. Fifer, L. E. Osborn, B. Christie, B. A. Wester, P. A. Celnik, D. Kramer, K. Pejsa, N. E. Crone, W. S. Anderson, N. Pouratian, B. Lee, C. Y. Liu, F. Tenore, L. Rieth, R. A. Andersen
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Abstract

Motivation The clinical success of brain-machine interfaces depends on overcoming both biological and material challenges to ensure a long-term stable connection for neural recording and stimulation. Therefore, there is a need to quantify any damage that microelectrodes sustain when they are chronically implanted in the human cortex.
量化 980 个皮层内微电极的物理退化情况,以及在三个人体中长期植入 956-2246 天的记录和刺激性能
动机 脑机接口的临床成功取决于克服生物和材料两方面的挑战,以确保神经记录和刺激的长期稳定连接。因此,有必要对长期植入人体皮层的微电极所遭受的任何损伤进行量化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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