Modeling of Optical Systems for Obtaining X-Ray Images of Inclined Objects

Abstract

The paper discusses an optical layout for obtaining reduced X-ray oblique images, which can be useful for X-ray lithography problems. A special feature of the layout is the ability to illuminate the photomask at small grazing angles while recording images with minimal distortion. Using numerical simulations carried out for an X-ray laser with an operating wavelength of 13.9 nm, the spatial resolution and field of view of this system are found.