Alterable fracture toughness of amorphous silica by injection and removal of electrostatic charge

IF 5.3 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Scripta Materialia Pub Date : 2024-09-11 DOI:10.1016/j.scriptamat.2024.116375

Wataru Matsunaga, Seiya Shichino, Takumi Takahashi, Takahiro Shimada, Hiroyuki Hirakata

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Abstract

In this study, we demonstrate that the fracture toughness of amorphous silica, an electrical insulator, can be dramatically increased and restored via injecting and removing the electrical charge content. Micropillar specimens of amorphous silica were fabricated using focused ion beam machining. The specimens were charged by electron-beam irradiation (charged specimens), and the charge was removed from the specimens by exposure to atmospheric conditions and annealing (charge-removed specimens). Fracture toughness testing was conducted on non-charged, charged, and charge-removed micropillar specimens. The fracture toughness of the charged specimen was 2.4 times higher than that of the non-charged specimens. Furthermore, the fracture toughness of the charge-removed specimens was restored to a level similar to that of the non-charged specimens, but not completely restored. These results indicate that the fracture toughness of amorphous silica can be controlled by injecting and removing electrostatic charges.

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通过注入和去除静电改变无定形二氧化硅的断裂韧性

在本研究中，我们证明了无定形二氧化硅这种电绝缘体的断裂韧性可以通过注入和去除电荷含量而显著提高和恢复。我们利用聚焦离子束加工技术制作了无定形二氧化硅的微柱状试样。通过电子束辐照使试样带电（带电试样），并通过暴露在大气条件下和退火从试样中去除电荷（去除电荷试样）。对未充电、已充电和已去除电荷的微柱试样进行了断裂韧性测试。带电试样的断裂韧性是不带电试样的 2.4 倍。此外，去电试样的断裂韧性恢复到了与未去电试样相似的水平，但并未完全恢复。这些结果表明，无定形二氧化硅的断裂韧性可以通过注入和去除静电荷来控制。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Scripta Materialia 工程技术-材料科学：综合

CiteScore

11.40

自引率

5.00%

发文量

581

审稿时长

34 days

期刊介绍： Scripta Materialia is a LETTERS journal of Acta Materialia, providing a forum for the rapid publication of short communications on the relationship between the structure and the properties of inorganic materials. The emphasis is on originality rather than incremental research. Short reports on the development of materials with novel or substantially improved properties are also welcomed. Emphasis is on either the functional or mechanical behavior of metals, ceramics and semiconductors at all length scales.