The high electron mobility for spin-down channel of two-dimensional spin-polarized half-metallic ferromagnetic EuSi2N4 monolayer

IF 3.4 3区 化学 Q2 CHEMISTRY, MULTIDISCIPLINARY
Bo Zhang, Huai-Qian Wang, Hui-Fang Li, Hao Zheng, Yong-Hang Zhang, Xun-Jie Mei, Jia-Ming Zhang, Kai-Le Jiang, Qing-Wei Jiang
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引用次数: 0

Abstract

The two-dimensional (2D) monolayer material MoSi2N4 was successfully synthesized in 2020[Hong et al., Science 369, 670, (2020)], exhibiting a plethora of new phenomena and unusual properties, with good stability at room temperature. However, MA2Z4 family monolayer materials involve primarily transition metal substitutions for M atoms. In order to address the research gap on lanthanide and actinide MA2Z4 materials, this work conducts electronic structure calculations on novel 2D MSi2N4 (M = La, Eu) monolayer materials by employing first-principles methods and CASTEP. High carrier mobility is discovered in the indirect bandgap semiconductor 2D LaSi2N4 monolayer (~5400 cm2 V−1 s−1) and in the spin (spin-down channel) carrier mobility of the half-metallic ferromagnetic EuSi2N4 monolayer (~2800 cm2 V−1 s−1). EuSi2N4 monolayer supplements research on spin carrier mobility in half-metallic ferromagnetic monolayer materials at room temperature and possesses a magnetic moment of 5 μB, which should not be underestimated. Furthermore, due to the unique electronic band structure of EuSi2N4 monolayer (with the spin-up channel exhibiting metallic properties and the spin-down channel exhibiting semiconductor properties), it demonstrates a 100% spin polarization rate, presenting significant potential applications in fields such as magnetic storage, magnetic sensing, and spintronics.

Abstract Image

二维自旋极化半金属铁磁性 EuSi2N4 单层自旋下降通道的高电子迁移率。
二维(2D)单层材料 MoSi2N4 于 2020 年成功合成[Hong 等,Science 369, 670, (2020)],表现出大量新现象和不寻常特性,并在室温下具有良好的稳定性。然而,MA2Z4 家族单层材料主要涉及 M 原子的过渡金属取代。为了填补镧系和锕系元素 MA2Z4 材料的研究空白,本研究采用第一性原理方法和 CASTEP 对新型二维 MSi2N4(M = La、Eu)单层材料进行了电子结构计算。在间接带隙半导体二维 LaSi2N4 单层材料(约 5400 cm2 V-1 s-1)和半金属铁磁性 EuSi2N4 单层材料的自旋(自旋向下通道)载流子迁移率(约 2800 cm2 V-1 s-1)中发现了高载流子迁移率。EuSi2N4 单层是对室温下半金属铁磁单层材料自旋载流子迁移率研究的补充,其磁矩为 5 μB,不容小觑。此外,由于 EuSi2N4 单层材料独特的电子带结构(自旋上升通道具有金属特性,自旋下降通道具有半导体特性),其自旋极化率高达 100%,在磁存储、磁传感和自旋电子学等领域具有巨大的应用潜力。
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来源期刊
CiteScore
6.60
自引率
3.30%
发文量
247
审稿时长
1.7 months
期刊介绍: This distinguished journal publishes articles concerned with all aspects of computational chemistry: analytical, biological, inorganic, organic, physical, and materials. The Journal of Computational Chemistry presents original research, contemporary developments in theory and methodology, and state-of-the-art applications. Computational areas that are featured in the journal include ab initio and semiempirical quantum mechanics, density functional theory, molecular mechanics, molecular dynamics, statistical mechanics, cheminformatics, biomolecular structure prediction, molecular design, and bioinformatics.
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