Paulius Andriūnas, Reda Čerapaitė-Trušinskienė, Arvaidas Galdikas
{"title":"Modeling of Plasma Nitriding of Austenitic Stainless Steel through a Mask","authors":"Paulius Andriūnas, Reda Čerapaitė-Trušinskienė, Arvaidas Galdikas","doi":"10.3390/coatings14081014","DOIUrl":null,"url":null,"abstract":"In this work, 2D simulations of stainless steel nitriding through a mask were performed with two configurations: with and without lateral adsorption under the mask, depending on the strength of the mask adhesion. The stress-induced diffusion and trapping–detrapping process are included as the main mechanisms of nitrogen mass transport. The main focus is on the analysis of the swelling process, which affects the expansion of the material. The surface concentration profiles and topographical profiles along the surface are calculated and compared with experimentally registered ones taken from the literature, and they show a good agreement. This allows for estimation of the values of model parameters. Because nitriding processes takes place in vertical and horizontal directions, the anisotropic aspect of nitriding are analyzed. It is shown that the adherence of the mask significantly influences the topographical profile and the anisotropy of nitriding, because in the case of a weakly adhered mask, a lateral adsorption process takes place under the mask. The influence of swelling and anisotropy in the case of pattern nitriding in small dimensions is discussed.","PeriodicalId":10520,"journal":{"name":"Coatings","volume":"1 1","pages":""},"PeriodicalIF":2.9000,"publicationDate":"2024-08-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Coatings","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.3390/coatings14081014","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
引用次数: 0
Abstract
In this work, 2D simulations of stainless steel nitriding through a mask were performed with two configurations: with and without lateral adsorption under the mask, depending on the strength of the mask adhesion. The stress-induced diffusion and trapping–detrapping process are included as the main mechanisms of nitrogen mass transport. The main focus is on the analysis of the swelling process, which affects the expansion of the material. The surface concentration profiles and topographical profiles along the surface are calculated and compared with experimentally registered ones taken from the literature, and they show a good agreement. This allows for estimation of the values of model parameters. Because nitriding processes takes place in vertical and horizontal directions, the anisotropic aspect of nitriding are analyzed. It is shown that the adherence of the mask significantly influences the topographical profile and the anisotropy of nitriding, because in the case of a weakly adhered mask, a lateral adsorption process takes place under the mask. The influence of swelling and anisotropy in the case of pattern nitriding in small dimensions is discussed.
CoatingsMaterials Science-Surfaces, Coatings and Films
CiteScore
5.00
自引率
11.80%
发文量
1657
审稿时长
1.4 months
期刊介绍:
Coatings is an international, peer-reviewed open access journal of coatings and surface engineering. It publishes reviews, research articles, communications and technical notes. Our aim is to encourage scientists to publish their experimental and theoretical results in as much detail as possible. There is no restriction on the length of the papers. Full experimental and/or methodical details must be provided. There are, in addition, unique features of this journal:
* manuscripts regarding research proposals and research ideas will be particularly welcomed
* electronic files or software regarding the full details of the calculation and experimental procedure - if unable to be published in a normal way - can be deposited as supplementary material