Investigation of microstructural and mechanical properties of sputter-deposited Ni3Al films at different substrate temperatures

IF 1.1 4区物理与天体物理 Q3 NUCLEAR SCIENCE & TECHNOLOGY

Radiation Effects and Defects in Solids Pub Date : 2024-08-09 DOI:10.1080/10420150.2024.2378409

Sunil Kumar Tiwari, Akula Umamaheswara Rao, Piyush Chandra Verma, Gaurav Pant, Devesh Kumar Avasthi, Sudip Sen, Amit Kumar Chawla

引用次数: 0

Abstract

Ni3Al films were deposited on silicon (100) substrate at different substrate temperatures by DC magnetron sputtering. The evolution of phase, microstructure, surface topography and mechanical prope...

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不同基底温度下溅射沉积 Ni3Al 薄膜的微观结构和机械性能研究

通过直流磁控溅射法在不同基底温度下将 Ni3Al 薄膜沉积在硅 (100) 基底上。这些薄膜的相变、微观结构、表面形貌和机械性能均发生了变化。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Radiation Effects and Defects in Solids 物理-核科学技术

CiteScore

1.60

自引率

20.00%

发文量

107

审稿时长

4 months

期刊介绍： The Journal covers a wide range of topics under radiation and plasma sciences. The range of contributions encompasses: radiation physics; radiochemistry, radiobiology and physical effects of medical irradiation, including research on radiative cell degeneration; optical, electrical and mechanical effects of radiation, and their secondary effects such as diffusion and particle emission from surfaces; plasma techniques and plasma phenomena. On plasma science the Journal covers all areas of fusion, space and low temperature plasmas.