Characterization of interface states and investigation of possible current conduction mechanisms in the Pt, Au, Cu/n-InP Schottky diodes

Hogyoung Kim
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Abstract

Based on the capacitance/conductance–voltage (C/G–V) and current–voltage (I–V) methods, the interface characteristics and the current conduction mechanisms of Pt/n-InP Schottky contacts were studied in detail. The interface states strongly affected the values of capacitance in the depletion region. From Terman, G–V, and forward I–V methods, the interface state density (Dit) was found to range from mid-1012 to mid-1013 eV-1cm-2. The forward current characteristics was not elucidated by the thermionic emission (TE) model assisted by tunneling via the interfacial layer. Rather, the spatially distributed inhomogeneous barrier could interpret the forward current characteristics. Trap-assisted tunneling involving phosphorous vacancy (VP)-related defects was observed to be dominant in the case of the reverse current characteristics. The comparison of Pt metal contact with Cu and Au contacts revealed that Pt contact has the highest Dit among three contacts.
铂、金、铜/n-InP 肖特基二极管中界面状态的特征和可能的电流传导机制研究
基于电容/电导-电压(C/G-V)和电流-电压(I-V)方法,详细研究了 Pt/n-InP 肖特基触点的界面特性和电流传导机制。界面状态对耗尽区的电容值有很大影响。通过特曼法、G-V 法和正向 I-V 法,发现界面态密度 (Dit) 在 1012 至 1013 eV-1cm-2 之间。热离子发射(TE)模型并没有阐明通过界面层进行隧道传输的正向电流特性。相反,空间分布的不均匀势垒可以解释正向电流特性。据观察,在反向电流特性中,涉及磷空位(VP)相关缺陷的陷阱辅助隧道效应占主导地位。将铂金属触点与铜和金触点进行比较后发现,在三种触点中,铂触点的 Dit 值最高。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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