Modeling, optimization and control of a ceramic tunnel kiln for consistent product quality under changing production demands

IF 3.9 2区 工程技术 Q2 COMPUTER SCIENCE, INTERDISCIPLINARY APPLICATIONS
Achilleas L. Arvanitidis , Margaritis Kostoglou , Michael C. Georgiadis
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引用次数: 0

Abstract

This study presents a detailed physics-based model focusing on an industrial tunnel kiln under feedback control. Initially, an empirical sintering model is integrated into the kiln model to accurately predict the product outlet density, a quality-defining parameter reflecting firing process efficacy. Afterwards, the initial steady-state burner valve positions are determined using industrial temperature data. Subsequently, the interactions between gas temperatures and burner valve positions are quantified through the investigation of the Relative Gain Array. A systematic derivation of optimal set-points for different production rates is then carried out, aiming at minimizing energy consumption while meeting end-product quality specifications. The PID controllers are tuned using a dynamic optimization approach, which involves the minimization of integral criteria. Finally, a case study is conducted to evaluate the efficacy of the optimal set-points under varying production rates. The results demonstrate exceptional system response, thus indicating that firing curves should adapt to production rates for consistently producing quality products.

对陶瓷隧道窑进行建模、优化和控制,以便在生产需求不断变化的情况下保持产品质量稳定
本研究以反馈控制下的工业隧道窑为重点,提出了一个详细的物理模型。首先,将一个经验烧结模型集成到窑炉模型中,以准确预测产品出口密度,这是一个反映烧制过程效率的质量定义参数。之后,利用工业温度数据确定初始稳态燃烧器阀门位置。随后,通过研究相对增益阵列来量化气体温度和燃烧器阀门位置之间的相互作用。然后,系统地推导出不同生产率下的最佳设定点,目的是在满足最终产品质量要求的同时最大限度地降低能耗。采用动态优化方法对 PID 控制器进行调整,其中涉及积分标准的最小化。最后,还进行了一项案例研究,以评估不同生产率下最优设定点的有效性。结果表明,系统的响应速度非常快,从而表明点火曲线应与生产率相适应,以持续生产优质产品。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Computers & Chemical Engineering
Computers & Chemical Engineering 工程技术-工程:化工
CiteScore
8.70
自引率
14.00%
发文量
374
审稿时长
70 days
期刊介绍: Computers & Chemical Engineering is primarily a journal of record for new developments in the application of computing and systems technology to chemical engineering problems.
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