Influence of material and geometry parameters on resonance linewidths of plasmonic modes in gratings made from highly doped Ge1-xSnx

F. Berkmann, P. Povolni, D. Schwarz, Inga Anita Fischer
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引用次数: 0

Abstract

Highly doped group IV semiconductors such as Ge or GeSn are promising candidates for plasmonic mid infrared applications. The lower effective mass of GeSn alloys in comparison to pure Ge can result in lower plasma wavelengths and extend the application wavelength range. Devices made from doped GeSn alloys, therefore, are one interesting route towards plasmonic applications in the MIR wavelength range, possibly extending to the NIR. Here, we specifically explore how spectrally narrow plasmonic resonances can be obtained in comb-like grating antennas by combining aspects of material growth with geometry optimization. We investigate both in simulation and in experiment how the interplay of localised surface plasmon resonances (LSPR) and Rayleigh anomalies (RA) can be tuned to achieve narrow extinction peaks originating from the resulting surface lattice resonances (SLR) generated in our antennas made from highly doped Ge1‑xSnx.Keywords: term, term, term
材料和几何参数对高掺杂 Ge1-xSnx 光栅中等离子模式共振线宽的影响
高掺杂 IV 族半导体(如 Ge 或 GeSn)是等离子体中红外应用的理想候选材料。与纯 Ge 相比,GeSn 合金的有效质量更低,因此等离子体波长更低,应用波长范围更广。因此,由掺杂 GeSn 合金制成的器件是在中红外波长范围内实现等离子应用的一条有趣途径,并有可能延伸到近红外。在此,我们特别探讨了如何通过将材料生长与几何优化相结合,在梳状光栅天线中获得光谱窄的等离子共振。我们在模拟和实验中研究了如何调整局部表面等离子体共振(LSPR)和瑞利反常(RA)的相互作用,以获得窄消光峰值,而窄消光峰值源于高掺杂 Ge1-xSnx 制成的天线中产生的表面晶格共振(SLR)。
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