Co-doped ZnO catalyst for non-thermal atmospheric pressure pulsating corona plasma degradation of reactive dye

IF 4.3 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
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Abstract

Reactive dyes in water are difficult to degrade due to their high stability. Plasma processes have a high potential for the degradation of dyes. In this work, Co-doped ZnO was prepared by electrodeposition and used as a catalyst for the degradation of RO 16 dye by non-thermal, positive pulsating corona discharge at atmospheric pressure. The catalytic mechanism and new insight into the interactions that enable the plasma catalysis were provided. The catalyst was characterized by cyclic voltammetry, SEM/EDX, XRD, FTIR, and BET. Doping with Co did not change the ZnO crystal structure, but caused slight changes in the lattice parameters, reduced the band gap, and increased the specific surface area. Co-doped ZnO improved the decolorization rate and energy yield by 17- and 21-fold, respectively. The dye degradation was caused by strong oxidizing agents generated in the plasma, mainly •OH radicals. Co-doped ZnO promoted the production of •OH radicals. The assumed catalytic mechanism, the role of the catalyst in the degradation reactions, and the degradation pathway were proposed. The decolorization rate and TOC removal were still high, but slightly lower in river water than in deionized water.

Abstract Image

用于活性染料非热常压脉冲电晕等离子体降解的掺杂氧化锌催化剂
水中的活性染料因其高度稳定性而难以降解。等离子工艺在降解染料方面具有很大的潜力。在这项工作中,通过电沉积制备了掺钴氧化锌,并将其用作催化剂,在常压下通过非热正向脉动电晕放电降解 RO 16 染料。该研究提供了催化机理,并对等离子体催化的相互作用有了新的认识。催化剂的表征方法包括循环伏安法、SEM/EDX、XRD、FTIR 和 BET。掺杂 Co 并没有改变氧化锌的晶体结构,但导致晶格参数发生轻微变化,降低了带隙,增加了比表面积。掺杂 Co 的氧化锌的脱色率和能量产率分别提高了 17 倍和 21 倍。染料降解是由等离子体中产生的强氧化剂引起的,主要是 -OH 自由基。掺杂ZnO促进了-OH自由基的产生。提出了假定的催化机理、催化剂在降解反应中的作用以及降解途径。河水的脱色率和 TOC 去除率仍然很高,但略低于去离子水。
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来源期刊
Materials Chemistry and Physics
Materials Chemistry and Physics 工程技术-材料科学:综合
CiteScore
8.70
自引率
4.30%
发文量
1515
审稿时长
69 days
期刊介绍: Materials Chemistry and Physics is devoted to short communications, full-length research papers and feature articles on interrelationships among structure, properties, processing and performance of materials. The Editors welcome manuscripts on thin films, surface and interface science, materials degradation and reliability, metallurgy, semiconductors and optoelectronic materials, fine ceramics, magnetics, superconductors, specialty polymers, nano-materials and composite materials.
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