Displacement damage effect of proton irradiation on vertical β-Ga2O3 and SiC Schottky barrier diodes (SBDs)

IF 6.7 3区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Young Jo Kim , Youngboo Moon , Jeong Hyun Moon , Hyoung Woo Kim , Wook Bahng , Hongsik Park , Young Jun Yoon , Jae Hwa Seo
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引用次数: 0

Abstract

In this study, we fabricated vertical Schottky barrier diodes (SBDs) based on wide bandgap semiconductor beta-phase gallium oxide (β-Ga2O3) and silicon carbide (SiC), respectively, and conducted proton irradiation experiments to analyze the radiation hardness of the SBDs comparatively. The effects of proton radiation on the performance of SBDs were assessed through measurements of forward current, capacitance, and breakdown characteristics. Both devices exhibited degradation in current and capacitance characteristics following proton irradiation, attributed to displacement damage (DD). Notably, the β-Ga2O3-based SBD demonstrated more pronounced deterioration compared to the SiC-based device despite similar vacancy distributions as confirmed by SRIM simulation. Moreover, a decrease in contact radius correlated with exacerbated degradation in the current characteristics of the β-Ga2O3-based SBD. Following proton irradiation, breakdown voltages of both devices increased due to elevated resistance induced by displacement damage. While both β-Ga2O3 and SiC-based SBDs experienced displacement damage under high fluence proton irradiation, the extent of performance degradation varied depending on the dimensions and quality of epitaxial and substrate layers.

质子辐照对垂直 β-Ga2O3 和 SiC 肖特基势垒二极管 (SBD) 的位移损伤效应
在这项研究中,我们分别基于宽带隙半导体β相氧化镓(β-Ga2O3)和碳化硅(SiC)制作了垂直肖特基势垒二极管(SBD),并进行了质子辐照实验,以比较分析 SBD 的辐照硬度。通过测量正向电流、电容和击穿特性,评估了质子辐照对 SBD 性能的影响。质子辐照后,两种器件的电流和电容特性都出现了衰减,这归因于位移损伤(DD)。值得注意的是,与基于碳化硅的器件相比,基于 β-Ga2O3 的 SBD 表现出更明显的劣化,尽管 SRIM 模拟证实了相似的空位分布。此外,接触半径的减小与基于 β-Ga2O3 的 SBD 的电流特性劣化加剧相关。质子辐照后,由于位移损伤导致电阻升高,两种器件的击穿电压都增加了。虽然在高通量质子辐照下,β-Ga2O3 和基于碳化硅的 SBD 都会出现位移损伤,但性能退化的程度因外延层和衬底层的尺寸和质量而异。
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来源期刊
Journal of Science: Advanced Materials and Devices
Journal of Science: Advanced Materials and Devices Materials Science-Electronic, Optical and Magnetic Materials
CiteScore
11.90
自引率
2.50%
发文量
88
审稿时长
47 days
期刊介绍: In 1985, the Journal of Science was founded as a platform for publishing national and international research papers across various disciplines, including natural sciences, technology, social sciences, and humanities. Over the years, the journal has experienced remarkable growth in terms of quality, size, and scope. Today, it encompasses a diverse range of publications dedicated to academic research. Considering the rapid expansion of materials science, we are pleased to introduce the Journal of Science: Advanced Materials and Devices. This new addition to our journal series offers researchers an exciting opportunity to publish their work on all aspects of materials science and technology within the esteemed Journal of Science. With this development, we aim to revolutionize the way research in materials science is expressed and organized, further strengthening our commitment to promoting outstanding research across various scientific and technological fields.
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