Enhanced antireflective and laser damage resistance of refractive-index gradient SiO2 nanostructured films at 1064 nm

IF 0.7 4区工程技术 Q4 CHEMISTRY, APPLIED

Polish Journal of Chemical Technology Pub Date : 2024-07-12 DOI:10.2478/pjct-2024-0014

Lili Wan, Jie Yang, Xiaoru Liu, Jiayi Zhu, Gang Xu, Chenchun Hao, Xuecheng Chen, Zhengwei Xiong

{"title":"Enhanced antireflective and laser damage resistance of refractive-index gradient SiO2 nanostructured films at 1064 nm","authors":"Lili Wan, Jie Yang, Xiaoru Liu, Jiayi Zhu, Gang Xu, Chenchun Hao, Xuecheng Chen, Zhengwei Xiong","doi":"10.2478/pjct-2024-0014","DOIUrl":null,"url":null,"abstract":"A facile sol-gel procedure was employed to create refractive-index gradient SiO2 antireflective (AR) films. A monolayer film, characterized by the porous crosslinking framework, was fabricated with a designed volume ratio mixture both with colloidal silica suspension and soluble organic polysiloxane. The upper layer for the bilayer film was a hexamethylisilazane (HMDS) modified colloidal silica suspension, leading to the film surface transfer to hydrophobic. The strategic design of nanostructures in the bottom and upper layers resulted in a refractive-index gradient SiO2 film with enhanced AR properties. The bilayer film demonstrated a transmittance of 99.5% at 1064 nm, accompanied by a notable reduction in reflectivity. Moreover, the laser-induced damage threshold of the bilayer film was increased by 30%, rising to as high as 24.7 J/cm2. The SiO2 nanostructured film both showed a refractive-index gradient structure with excellent AR properties and exhibited good laser damage resistance.","PeriodicalId":20324,"journal":{"name":"Polish Journal of Chemical Technology","volume":"57 1","pages":""},"PeriodicalIF":0.7000,"publicationDate":"2024-07-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Polish Journal of Chemical Technology","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.2478/pjct-2024-0014","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"CHEMISTRY, APPLIED","Score":null,"Total":0}

引用次数: 0

Abstract

A facile sol-gel procedure was employed to create refractive-index gradient SiO2 antireflective (AR) films. A monolayer film, characterized by the porous crosslinking framework, was fabricated with a designed volume ratio mixture both with colloidal silica suspension and soluble organic polysiloxane. The upper layer for the bilayer film was a hexamethylisilazane (HMDS) modified colloidal silica suspension, leading to the film surface transfer to hydrophobic. The strategic design of nanostructures in the bottom and upper layers resulted in a refractive-index gradient SiO2 film with enhanced AR properties. The bilayer film demonstrated a transmittance of 99.5% at 1064 nm, accompanied by a notable reduction in reflectivity. Moreover, the laser-induced damage threshold of the bilayer film was increased by 30%, rising to as high as 24.7 J/cm2. The SiO2 nanostructured film both showed a refractive-index gradient structure with excellent AR properties and exhibited good laser damage resistance.

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在 1064 纳米波长下增强折射率梯度 SiO2 纳米结构薄膜的抗反射性和抗激光损伤性

我们采用了一种简便的溶胶-凝胶法来制造折射率梯度二氧化硅抗反射（AR）薄膜。采用胶体二氧化硅悬浮液和可溶性有机聚硅氧烷的设计体积比混合物制备了以多孔交联框架为特征的单层薄膜。双层膜的上层是六甲基异硅氮烷（HMDS）改性胶体二氧化硅悬浮液，从而使薄膜表面转为疏水性。通过对底层和上层纳米结构的策略性设计，形成了具有增强 AR 特性的折射率梯度二氧化硅薄膜。双层薄膜在 1064 纳米波长下的透过率达到 99.5%，同时反射率显著降低。此外，双层薄膜的激光诱导损伤阈值提高了 30%，高达 24.7 J/cm2。二氧化硅纳米结构薄膜既呈现出折射率梯度结构，具有优异的 AR 特性，又表现出良好的抗激光损伤能力。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Polish Journal of Chemical Technology CHEMISTRY, APPLIED-ENGINEERING, CHEMICAL

CiteScore

1.70

自引率

10.00%

发文量

审稿时长

4.5 months

期刊介绍： Polish Journal of Chemical Technology is a peer-reviewed, international journal devoted to fundamental and applied chemistry, as well as chemical engineering and biotechnology research. It has a very broad scope but favors interdisciplinary research that bring chemical technology together with other disciplines. All authors receive very fast and comprehensive peer-review. Additionally, every published article is promoted to researchers working in the same field.