Morphology of Al Thin Films Deposited Under Different Magnetic Field Configurations by Grid-assisted Magnetron Sputtering

Abstract

Aluminum thin films were deposited by unbalanced grid-assisted magnetron sputtering. Depositions were made with different net charges of the particles bombarding the substrate through modifications in the magnetic field with the aid of permanent and electro magnets. Film morphology was evaluated by atomic force microscopy and the results point out that the surface roughness of the film deposited with net positive ions bombardment is about five times higher than the surface roughness obtained with net electrons bombardment and ten times higher than that obtained with neutral net charge bombardment.